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15 条记录 (耗时 0.039 秒)

    Method for thermal development of a photosensitive element using a development medium having a support
    7.
    发明授权
    Method for thermal development of a photosensitive element using a development medium having a support 有权
    使用具有支撑体的显影介质的光敏元件的热显影方法

    公开(公告)号：US07358026B2

    公开(公告)日：2008-04-15

    申请号：US11227520

    申请日：2005-09-15

    申请人： Dietmar Dudek ,  Mark A. Hackler ,  Robert A. McMillen ,  Allan Banke

    发明人： Dietmar Dudek ,  Mark A. Hackler ,  Robert A. McMillen ,  Allan Banke

    IPC分类号： G03F7/34 ,  B44C1/165

    CPC分类号： B41C1/055 ,  B41C1/06 ,  G03F7/36

    摘要： This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium under tension to the element to absorb the liquefied composition. The development medium includes an absorbent material and a support, the combination of which minimizes stretch and distortion of the absorbent material and can impede the migration of the liquefied composition through the absorbent material.

    摘要翻译： 本发明涉及一种用于热敏显影感光元件以形成浮雕图案的方法。 该方法包括加热该元件的组合物层以使该层的一部分液化，并向该元件提供张力下的显影介质以吸收液化组合物。 显影介质包括吸收材料和支撑体，其组合使吸收材料的拉伸和变形最小化并且可阻碍液化组合物通过吸收材料的迁移。

    APPARATUS AND METHOD FOR PREPARING RELIEF PRINTING FORM
    8.
    发明申请
    APPARATUS AND METHOD FOR PREPARING RELIEF PRINTING FORM 有权
    制备缓解印刷形式的装置和方法

    公开(公告)号：US20130148089A1

    公开(公告)日：2013-06-13

    申请号：US13493004

    申请日：2012-06-11

    申请人： MICHAEL LEE RUDOLPH ,  Joseph Anthony Perrotto ,  Dhiren V. Patel ,  Robert A. McMillen

    发明人： MICHAEL LEE RUDOLPH ,  Joseph Anthony Perrotto ,  Dhiren V. Patel ,  Robert A. McMillen

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70858 ,  G03F1/003 ,  G03F1/68 ,  G03F7/2012

    摘要： The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.

    摘要翻译： 本发明提供一种用于从感光元件制备凸版印刷版的方法和装置。 更具体地说，本发明描述了一种用于在暴露于光化辐射期间具有受控氧浓度的环境中制备浮雕形式的方法和装置。 该方法包括在感光元件上形成原位掩模，在具有惰性气体和氧浓度在190,000至100ppm之间的环境中将元件暴露于通过原位掩模的光化辐射，并将暴露的元件处理 形成具有凸起表面积的图案的凸版印刷版。

    Process and apparatus having an adjustable heater
    9.
    发明授权
    Process and apparatus having an adjustable heater 有权
    具有可调加热器的工艺和设备

    公开(公告)号：US08359975B2

    公开(公告)日：2013-01-29

    申请号：US12428592

    申请日：2009-04-23

    申请人： Robert A. McMillen ,  Dietmar Dudek ,  Ib Vestergaard

    发明人： Robert A. McMillen ,  Dietmar Dudek ,  Ib Vestergaard

    IPC分类号： B41C1/055 ,  G03F7/26

    CPC分类号： G03F7/36

    摘要： This invention provides an apparatus and process for forming a printing form from a photosensitive element having an exterior surface and a composition layer capable of being partially liquefied. The apparatus includes a displaceable heater for heating the composition layer, means for removing at least a portion of the composition layer from the element, and means for displacing the displaceable heater to a predetermined distance from the exterior surface. Positioning the displaceable heater at the predetermined distance assures reproducible removal of the liquefied composition from the various types of photosensitive elements that can be thermally treated in the apparatus, resulting in the printing forms having improved relief surface uniformity.

    摘要翻译： 本发明提供一种用于从具有外表面和能够部分液化的组合物层的感光元件形成印刷形式的装置和方法。 该装置包括用于加热组合物层的可移位加热器，用于从元件去除组合物层的至少一部分的装置，以及用于使可移动加热器移位到距离外表面预定距离的装置。 将可置换加热器定位在预定距离处，确保液体组合物可以从设备中可以热处理的各种类型的感光元件中去除，从而使印刷形式具有改进的浮雕表面均匀性。

    DEVICE AND METHOD FOR PREPARING RELIEF PRINTING FORM
    10.
    发明申请
    DEVICE AND METHOD FOR PREPARING RELIEF PRINTING FORM 审中-公开
    制备缓解印刷形式的装置和方法

    公开(公告)号：US20090191482A1

    公开(公告)日：2009-07-30

    申请号：US12356752

    申请日：2009-01-21

    申请人： MICHAEL LEE RUDOLPH ,  Joseph Anthony Perrotto ,  Dhiren V. Patel ,  Robert A. McMillen

    发明人： MICHAEL LEE RUDOLPH ,  Joseph Anthony Perrotto ,  Dhiren V. Patel ,  Robert A. McMillen

    IPC分类号： G03F7/20 ,  G21G5/00

    CPC分类号： G03F7/2012 ,  G21F5/02

    摘要： The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a lo photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.

    摘要翻译： 本发明提供一种用于从感光元件制备凸版印刷版的方法和装置。 更具体地说，本发明描述了一种用于在暴露于光化辐射期间具有受控氧浓度的环境中制备浮雕形式的方法和装置。 该方法包括在lo感光元件上形成原位掩模，在具有惰性气体和氧浓度在190,000至100ppm之间的环境中将元件暴露于通过原位掩模的光化辐射，以及处理暴露元件 以形成具有凸起表面积的图案的凸版印刷版。