公开(公告)号：US6152175A

公开(公告)日：2000-11-28

申请号：US89346

申请日：1998-06-03

申请人： Masahito Itoh ,  Toshiyasu Inagaki ,  Minoru Ueta ,  Masahiko Yada ,  Hiroshi Itafuji

发明人： Masahito Itoh ,  Toshiyasu Inagaki ,  Minoru Ueta ,  Masahiko Yada ,  Hiroshi Itafuji

IPC分类号： F16K27/00 ,  F17D1/04 ,  F16K51/00

CPC分类号： F16K27/003 ,  F17D1/04 ,  Y10T137/87571 ,  Y10T137/87684 ,  Y10T137/87885

摘要： A process gas supply unit without conventional pipes. The process gas supply unit may include the components of a mass flow controller, an input valve, an output valve, a purge valve, a vacuum valve, a check valve, a regulator, and a filter. Module blocks are attached to at least one of the components with bolts from a predetermined direction. The module blocks are mounted on base plates with bolts from the same predetermined direction, and the base plates are mounted on a mounting panel with bolts from the same predetermined direction.

摘要翻译： 没有常规管道的工艺气体供应单元。 过程气体供应单元可以包括质量流量控制器，输入阀，输出阀，净化阀，真空阀，止回阀，调节器和过滤器的组件。 模块通过螺栓从预定方向附接至至少一个部件。 模块通过螺栓从相同的预定方向安装在基板上，并且用相同的预定方向的螺栓将基板安装在安装面板上。

公开(公告)号：US06209571B1

公开(公告)日：2001-04-03

申请号：US09074589

申请日：1998-05-08

申请人： Masahito Itoh ,  Toshiyasu Inagaki

发明人： Masahito Itoh ,  Toshiyasu Inagaki

IPC分类号： F16K5100

CPC分类号： F16K27/003 ,  F16K51/00 ,  Y10T137/4259 ,  Y10T137/87571 ,  Y10T137/87885

摘要： A process gas supply unit has a supply valve for supplying process gas to a semiconductor manufacturing apparatus, a purge valve for supplying inert gas, a check valve provided in a passage between an inert gas source and the purge valve and a common manifold provided with the supply valve, the purge valve and the check valve. Therefore, these parts are mounted on a mass flow controller as a unit and the process gas unit can be made compact and integrated as a whole.

摘要翻译： 处理气体供给单元具有用于向半导体制造装置供给处理气体的供给阀，用于供给惰性气体的净化阀，设置在惰性气体源和净化阀之间的通路中的止回阀以及设置有 供气阀，净化阀和止回阀。因此，这些部件作为一个单元安装在质量流量控制器上，整个过程气体单元可以紧凑集成。