SUBSTRATE MOUNTING STAGE AND SURFACE TREATMENT METHOD THEREFOR
    1.
    发明申请
    SUBSTRATE MOUNTING STAGE AND SURFACE TREATMENT METHOD THEREFOR 有权
    基板安装阶段及其表面处理方法

    公开(公告)号:US20080217291A1

    公开(公告)日:2008-09-11

    申请号:US12028904

    申请日:2008-02-11

    IPC分类号: C23F1/00 B44C1/22

    摘要: A substrate mounting stage that prevents poor attraction of substrates so as to improve the operating rate of a substrate processing apparatus. The substrate mounting stage is disposed in the substrate processing apparatus and has a substrate mounting surface on which a substrate is mounted. The arithmetic average roughness (Ra) of the substrate mounting surface is not less than a first predetermined value, and the initial wear height (Rpk) of the substrate mounting surface is not more than a second predetermined value.

    摘要翻译: 一种基板安装台,其防止基板的吸引力降低,从而提高基板处理装置的运转速度。 基板安装台设置在基板处理装置中,并且具有安装有基板的基板安装面。 基板安装面的算术平均粗糙度(Ra)不小于第一预定值,并且基板安装表面的初始磨损高度(Rpk)不大于第二预定值。

    PLASMA PROCESSING APPARATUS AND STRUCTURE THEREIN
    2.
    发明申请
    PLASMA PROCESSING APPARATUS AND STRUCTURE THEREIN 有权
    等离子体加工设备及其结构

    公开(公告)号:US20080230181A1

    公开(公告)日:2008-09-25

    申请号:US12046723

    申请日:2008-03-12

    IPC分类号: H01L21/3065 C23C16/452

    CPC分类号: C23C16/4581 C23C16/5096

    摘要: A structure, for use in a processing chamber of a plasma processing apparatus in which a plasma process is performed on a target substrate, includes a base member at least having a first surface and a second surface; and a thermally sprayed insulating film covering the first surface. Further, the structure includes an insulating protection member covering the second surface and made of a material having a linear expansion coefficient different from that of the base member; and a buffing surface covered with an insulating layer interposed between the thermally sprayed insulating film and the insulating protection member to prevent a contact therebetween. The thermally sprayed insulating film, the insulating protection member and the insulating layer constitute an insulating surface covering the first surface and the second surface.

    摘要翻译: 一种在目标基板上进行等离子体处理的等离子体处理装置的处理室中使用的结构,具有至少具有第一面和第二面的基材, 以及覆盖所述第一表面的热喷涂绝缘膜。 此外,该结构包括覆盖第二表面并由具有不同于基底构件的线性膨胀系数的材料制成的绝缘保护构件; 以及抛光表面,覆盖有插入在所述热喷镀绝缘膜和所述绝缘保护构件之间的绝缘层,以防止其间的接触。 绝热保护部件和绝缘层的热喷镀绝缘膜构成覆盖第一面和第二面的绝缘面。