Chemical decontamination apparatus and decontamination method therein
    1.
    发明授权
    Chemical decontamination apparatus and decontamination method therein 有权
    化学除污设备及其去污方法

    公开(公告)号:US08440876B2

    公开(公告)日:2013-05-14

    申请号:US12278864

    申请日:2007-02-06

    CPC分类号: G21F9/28 G21F9/002 G21F9/004

    摘要: A chemical decontamination apparatus of the present invention chemically dissolves radioactive substance-containing oxide films formed or adhering on the surface of a decontamination object by using ozone water to conduct decontamination. The chemical decontamination apparatus includes an ozone generating unit for generating ozone gas, an ozone supplying device for supplying the generated ozone gas to an ozone supplying unit in water, and a sintered metal element 37 which is disposed in the ozone supplying unit and to which ozone gas is supplied from the ozone supplying device. The ozone gas supplied to a sintered metal element interior from the ozone supplying device is allowed to flow out of the element into water so as to generate ozone water.

    摘要翻译: 本发明的化学去污设备通过使用臭氧水对通过使用臭氧水形成或附着在去污物体的表面上的含放射性物质的氧化物膜进行化学溶解以进行去污。 化学去污设备包括用于产生臭氧气体的臭氧发生单元,用于将产生的臭氧气体供应到水中的臭氧供应单元的臭氧供应装置,以及设置在臭氧供应单元中的烧结金属元件37, 从臭氧供给装置供给气体。 从臭氧供给装置供给到烧结金属元件内部的臭氧气体被允许从元件流出到水中以产生臭氧水。

    CHEMICAL DECONTAMINATION APPARATUS AND DECONTAMINATION METHOD THEREIN
    2.
    发明申请
    CHEMICAL DECONTAMINATION APPARATUS AND DECONTAMINATION METHOD THEREIN 有权
    化学消毒装置及其去除方法

    公开(公告)号:US20100168497A1

    公开(公告)日:2010-07-01

    申请号:US12278864

    申请日:2007-02-06

    CPC分类号: G21F9/28 G21F9/002 G21F9/004

    摘要: A chemical decontamination apparatus of the present invention chemically dissolves radioactive substance-containing oxide films formed or adhering on the surface of a decontamination object by using ozone water to conduct decontamination. The chemical decontamination apparatus includes an ozone generating unit for generating ozone gas, an ozone supplying device for supplying the generated ozone gas to an ozone supplying unit in water, and a sintered metal element 37 which is disposed in the ozone supplying unit and to which ozone gas is supplied from the ozone supplying device. The ozone gas supplied to a sintered metal element interior from the ozone supplying device is allowed to flow out of the element into water so as to generate ozone water.

    摘要翻译: 本发明的化学去污设备通过使用臭氧水对通过使用臭氧水形成或附着在去污物体的表面上的含放射性物质的氧化物膜进行化学溶解以进行去污。 化学去污设备包括用于产生臭氧气体的臭氧发生单元,用于将产生的臭氧气体供应到水中的臭氧供应单元的臭氧供应装置,以及设置在臭氧供应单元中的烧结金属元件37, 从臭氧供给装置供给气体。 从臭氧供给装置供给到烧结金属元件内部的臭氧气体被允许从元件流出到水中以产生臭氧水。

    SYSTEM AND METHOD FOR CHEMICAL DECONTAMINATION OF RADIOACTIVE MATERIAL
    4.
    发明申请
    SYSTEM AND METHOD FOR CHEMICAL DECONTAMINATION OF RADIOACTIVE MATERIAL 有权
    放射性物质化学去除的系统与方法

    公开(公告)号:US20060167330A1

    公开(公告)日:2006-07-27

    申请号:US10717628

    申请日:2003-11-21

    IPC分类号: G21F9/00

    摘要: A method for chemically decontaminating radioactive material. The method includes reducing-dissolving step for setting surface of radioactive material in contact with reducing decontamination liquid including mono-carboxylic acid and di-carboxylic acid as dissolvent; and oxidizing-dissolving step for setting the surface of the radioactive material in contact with oxidizing decontamination liquid including oxidizer. The method may include repeated pairs of steps, each pair including the reducing-dissolving step and the oxidizing-dissolving step. The mono-carboxylic acid may include formic acid, and the di-carboxylic acid includes oxalic acid. The oxidizer may be ozone, permanganic acid or permanganate.

    摘要翻译: 一种化学去除放射性物质的方法。 该方法包括用于使放射性物质的表面与包含单羧酸和二羧酸的还原性去污液接触的还原溶解步骤作为溶剂; 以及用于使放射性物质的表面与包括氧化剂的氧化性去污液接触的氧化溶解步骤。 该方法可以包括重复的步骤对,每对包括还原溶解步骤和氧化溶解步骤。 单羧酸可以包括甲酸,二羧酸包括草酸。 氧化剂可以是臭氧,高锰酸或高锰酸盐。

    System and method for chemical decontamination of radioactive material
    8.
    发明授权
    System and method for chemical decontamination of radioactive material 有权
    放射性物质化学去污的系统和方法

    公开(公告)号:US07087120B1

    公开(公告)日:2006-08-08

    申请号:US10717628

    申请日:2003-11-21

    IPC分类号: G21F9/28

    摘要: A method for chemically decontaminating radioactive material. The method includes reducing-dissolving step for setting surface of radioactive material in contact with reducing decontamination liquid including mono-carboxylic acid and di-carboxylic acid as dissolvent; and oxidizing-dissolving step for setting the surface of the radioactive material in contact with oxidizing decontamination liquid including oxidizer. The method may include repeated pairs of steps, each pair including the reducing-dissolving step and the oxidizing-dissolving step. The mono-carboxylic acid may include formic acid, and the di-carboxylic acid includes oxalic acid. The oxidizer may be ozone, permanganic acid or permanganate.

    摘要翻译: 一种化学去除放射性物质的方法。 该方法包括用于使放射性物质的表面与包含单羧酸和二羧酸的还原性去污液接触的还原溶解步骤作为溶剂; 以及用于使放射性物质的表面与包括氧化剂的氧化性去污液接触的氧化溶解步骤。 该方法可以包括重复的步骤对,每对包括还原溶解步骤和氧化溶解步骤。 单羧酸可以包括甲酸,二羧酸包括草酸。 氧化剂可以是臭氧,高锰酸或高锰酸盐。