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公开(公告)号：US4702935A
公开(公告)日：1987-10-27
申请号：US663128
申请日：1984-10-22
申请人： Masaru Kadono , Kumio Nago , Tatsushi Yamamoto , Tersuro Muramatsu , Shuuhei Tsuchimoto , Mitsuhiko Yoshikawa , Masatoshi Tomita
发明人： Masaru Kadono , Kumio Nago , Tatsushi Yamamoto , Tersuro Muramatsu , Shuuhei Tsuchimoto , Mitsuhiko Yoshikawa , Masatoshi Tomita
CPC分类号： H01F41/20 , C23C14/14 , C23C14/30 , H01F10/145
摘要： A production method for producing a high permeability alloy film which includes evaporating an alloy material composed of 1-6 wt % Al, 20-35 wt % Si, and the remainder of iron by irradiating the alloy with an electron beam, and then depositing the vapor from the alloy material onto a substrate for a predetermined time to produce an alloy film composition having a high permeability. The vapor deposition onto the substrate is preferably intercepted with the shutter until the concentration of aluminum of the vapor to be deposited has been decreased to a value between 20 and about 4 wt %.
摘要翻译： 一种高渗透性合金膜的制造方法，其特征在于，通过用电子束照射所述合金，蒸发由1〜6重量％的Al，20〜35重量％的Si和剩余的铁构成的合金材料， 将合金材料蒸镀到基板上一段预定时间以产生具有高磁导率的合金膜组合物。 基板上的气相沉积优选用快门截取，直到要沉积的蒸汽的铝浓度降低到20至约4wt％之间的值。
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公开(公告)号：US4592923A
公开(公告)日：1986-06-03
申请号：US664425
申请日：1984-10-24
CPC分类号： C23C14/14
摘要： A method for producing a high magnetic permeability alloy film, wherein an alloy material composed of 1-6 wt % Al, 20-35 wt % Si and the remainder of iron is irradiated with an electron beam in a vacuum deposition apparatus equipped with an electron gun, and the vapor of the alloy material is deposited on a substrate for a predetermined time to form a high magnetic permeability alloy film, comprising further a step of preventing the irregular deposition caused if the concentration of aluminum in the vapor to be deposited increases.
摘要翻译： 一种制造高磁导率合金膜的方法，其中在装有电子的真空沉积设备中用电子束照射由1-6重量％的Al，20-35重量％的Si和剩余的铁组成的合金材料 并且合金材料的蒸气在基板上沉积预定时间以形成高磁导率合金膜，还包括如果要沉积的蒸汽中的铝浓度增加而导致的不规则沉积步骤。
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