公开(公告)号：US5035200A

公开(公告)日：1991-07-30

申请号：US579251

申请日：1990-09-05

申请人： Masashi Moriyama ,  Yutaka Yamahira ,  Yuji Matsuyama

发明人： Masashi Moriyama ,  Yutaka Yamahira ,  Yuji Matsuyama

IPC分类号： B01J4/00 ,  B01J19/00 ,  H01L21/304

CPC分类号： B01J19/0006

摘要： A processing liquid supply unit comprises a storage tank for storing a processing liquid, a sensor for sensing the amount of processing liquid stored in the storage tank, a refilling mechanism for automatically refilling the processing liquid into the storage tank when the sensor senses that the amount of processing liquid in the storage tank drops below the specified value and a processing liquid delivery mechanism for delivering the processing liquid from the storage tank to an object being processed.

摘要翻译： 处理液体供应单元包括用于存储处理液体的储存罐，用于感测存储在储存罐中的处理液体的量的传感器，当传感器感测到该量时，自动将处理液体重新填充到储存罐中的再填充机构 储存罐中的处理液的液滴低于规定值，以及处理液输送机构，用于将处理液从储罐输送到被处理物。

公开(公告)号：US06311091B1

公开(公告)日：2001-10-30

申请号：US09174541

申请日：1998-10-19

申请人： Yutaka Yamahira

发明人： Yutaka Yamahira

IPC分类号： G05B1132

CPC分类号： H01L21/67242 ,  H01L21/67178 ,  H01L21/67253

摘要： A substrate processing apparatus for coating resist onto a substrate and developing the coated resist, comprising a power supply equipped with a main switch controlled in an ON/OFF manner, a plurality of electric appliances operated substantially in the same manner when power is supplied from the power supply, a power distribution circuit for supplying power to each of the plurality of electric appliances, and a control section connected to the power distribution circuit, for controlling power-supply timing to the plurality of electric appliances. The control section staggers power-supply timing to each of the electric appliances when the main switch is turned on.

摘要翻译： 一种用于将抗蚀剂涂覆在基板上并显影涂覆的抗蚀剂的基板处理装置，包括配备有以开/关方式控制的主开关的电源，当从电源供应电力时基本上以相同方式操作的多个电器 电源，用于向多个电器中的每一个提供电力的配电电路，以及连接到配电电路的控制部分，用于控制对多个电器的电源定时。 当主开关打开时，控制部分将每个电器的电源定时交错。

公开(公告)号：US5498294A

公开(公告)日：1996-03-12

申请号：US154964

申请日：1993-11-19

申请人： Michiaki Matsushita ,  Yutaka Yamahira

发明人： Michiaki Matsushita ,  Yutaka Yamahira

IPC分类号： H01L21/304 ,  H01L21/00 ,  H01L21/677 ,  H02P8/12 ,  B08B7/04 ,  B08B11/00

CPC分类号： H01L21/67028 ,  Y10S134/902

摘要： A substrates-cleaning apparatus including a first unit provided with a scrubber for scrubbing a single side of a substrate, a second unit provided with a turning mechanism for turning the substrate upside down or vice versa, and a carrier robot for carrying the substrate between the first and the second unit.

摘要翻译： 一种基板清洁装置，包括：第一单元，设置有用于洗涤基板的单侧的洗涤器;第二单元，设置有用于将基板上下颠倒的反转的转动机构;以及用于将基板承载在基板之间的载体机器人 第一和第二单位。