公开(公告)号：US20110027478A1

公开(公告)日：2011-02-03

申请号：US12935553

申请日：2009-03-30

申请人： Masato Fukushima ,  Tsubasa Okada ,  Hiroyuki Yamazaki ,  Naoyuki Imai

发明人： Masato Fukushima ,  Tsubasa Okada ,  Hiroyuki Yamazaki ,  Naoyuki Imai

IPC分类号： B05D3/12 ,  B05D1/02 ,  B05D3/00 ,  B08B3/00

CPC分类号： G11B5/855 ,  B05D1/00 ,  B05D1/002

摘要： Provided is a double-side coating apparatus which can uniformly coat both surfaces of a substrate to be processed with a coating solution and form uniform coating films on both the surfaces of the substrate to be processed. A double-side coating apparatus (1) includes a holding mechanism (3a) which holds a substrate (2) to be processed so that the thickness direction of the substrate (2) to be processed is a horizontal direction; a rotational driving mechanism which rotates the substrate (2) to be processed in a circumferential direction; a first coating solution nozzle (18a) which jets a coating solution onto one main surface (2a) of the substrate (2) to be processed; and a second coating solution nozzle which jets the coating solution onto the other main surface (2b) of the substrate (2) to be processed. The first coating solution nozzle (18a) and the second coating solution nozzle are symmetrically arranged with respect to a thickness center surface of the substrate (2) to be processed. Provided is an edge rinsing apparatus which can accurately and stably rinse only a fixed width of an outer peripheral portion of the substrate and can easily control the width of the outer peripheral portion to be rinsed even if the width of the outer peripheral portion to be rinsed is small.

摘要翻译： 提供一种双面涂布装置，其能够均匀地涂布被处理基板的两面，并且在被处理基板的两面上形成均匀的涂膜。 双面涂布装置（1）包括：保持机构（3a），其保持要处理的基板（2），使得待处理的基板（2）的厚度方向为水平方向; 旋转驱动机构，其使圆​​周方向的被处理基板旋转; 第一涂布溶液喷嘴（18a），其将涂布溶液喷射到待处理的基板（2）的一个主表面（2a）上; 以及第二涂布溶液喷嘴，其将涂布溶液喷射到待处理的基板（2）的另一个主表面（2b）上。 第一涂布溶液喷嘴（18a）和第二涂布液喷嘴相对于待处理的基板（2）的厚度中心表面对称地布置。 本发明提供一种边缘冲洗装置，其能够精确稳定地仅冲洗基板的外周部的固定宽度，并且即使要冲洗的外周部的宽度也容易控制要冲洗的外周部的宽度 是小。