SUPPORT UNIT, FILM FORMING APPARATUS, AND CARRIER SUPPORT METHOD

    公开(公告)号:US20240207889A1

    公开(公告)日:2024-06-27

    申请号:US18493123

    申请日:2023-10-24

    Inventor: Takayuki Mori

    CPC classification number: B05C13/00 B05D1/002

    Abstract: A support unit of a carrier that holds a substrate, includes a plurality of rotating members configured to support the carrier inside a chamber where a film forming process is performed on the substrate when transporting the carrier, and a support body configured to rotatably support the plurality of rotating members inside the chamber. The support body extends from an upstream side to a downstream side in a transport direction of the carrier. The plurality of rotating members are arranged on the support body in a line from the upstream side to the downstream side of the support body. An interval between adjacent rotating members of a first set disposed on one of the upstream side and the downstream side of the support body is narrower than an interval between adjacent rotating members of a second set disposed between the upstream side and the downstream side of the support body.

    SUBSTRATE TREATING APPARATUS, SUBSTRATE TREATING SYSTEM, AND SUBSTRATE TREATING METHOD

    公开(公告)号:US20230256463A1

    公开(公告)日:2023-08-17

    申请号:US18168508

    申请日:2023-02-13

    CPC classification number: B05B12/122 B05D1/002 B05B13/0228

    Abstract: Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes a design information memory unit configured to store three-dimensional design information, an imaging unit configured to capture a real image containing the target components, a matching processing unit configured to determine which of the target components matches a real image shape as a two-dimensional shape in the real image captured by the imaging unit in accordance with a degree of coincidence of feature points between the real image shape and a two-dimensional design shape based on three-dimensional design information about the target components, and an abnormality detecting unit configured to detect an abnormality of the target component through comparison between the reality information about the matched target component based on the real image and the normal information based on the three-dimensional design information when the target component is normal.

    APPLICATION METHOD
    8.
    发明申请
    APPLICATION METHOD 审中-公开

    公开(公告)号:US20180133748A1

    公开(公告)日:2018-05-17

    申请号:US15807643

    申请日:2017-11-09

    Inventor: Naozumi FUJIWARA

    CPC classification number: B05D1/002 B08B3/08 H01L21/67023 H01L21/67051

    Abstract: For a substrate having a diameter of 300 millimeters and a main surface on which a lot of pattern elements standing upright are formed, a processing using a processing liquid is performed on the main surface. After the processing using the processing liquid, a filler solution is applied onto the main surface. In the application process of the filler solution, pure water is supplied onto the main surface which faces upward while the substrate is in a horizontal state, and a liquid film of the pure water which covers the main surface and has a thickness not larger than 5 micrometers is formed by rotating the substrate. Then, the filler solution containing a water-soluble filler is supplied onto a center portion of the main surface while the substrate is rotated at the number of rotation not smaller than 300 times and not larger than 500 times per minute.

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