公开(公告)号：US5891806A

公开(公告)日：1999-04-06

申请号：US842897

申请日：1997-04-17

申请人： Masato Shibuya ,  Keiichiro Sakato ,  Akira Miyaji ,  Toshiyuki Namikawa ,  Takashi Mori

发明人： Masato Shibuya ,  Keiichiro Sakato ,  Akira Miyaji ,  Toshiyuki Namikawa ,  Takashi Mori

IPC分类号： G03F7/20 ,  H01L21/00

CPC分类号： G03F7/70091 ,  G03F7/702 ,  G03F7/7035 ,  G03F7/70358 ,  Y10S438/942

摘要： Apparatus and methods are disclosed for increasing the illuminance at a mask used for proximity-type microlithography and for achieving increases in throughput. A mask defining a pattern is illuminated by an illumination optical system. The pattern is transferred to a workpiece separated from the mask by a prescribed standoff. The mask and workpiece can be relatively moved in a scan direction. With respect to the illumination optical system, the workpiece-side numerical aperture in a first direction on the plane of the mask is different from the workpiece-side numerical aperture in a second direction, perpendicular to the first direction, on the plane of the mask. A reflective-type relay optical system can be included that comprises first and second spherical mirrors that do not produce chromatic aberrations.

摘要翻译： 公开了用于增加用于接近型微光刻的掩模的照度和用于实现生产量增加的装置和方法。 定义图案的掩模由照明光学系统照亮。 将图案转移到与掩模分开的工件中，以规定的间距。 掩模和工件可以沿扫描方向相对移动。 相对于照明光学系统，在掩模的平面上的第一方向上的工件侧数值孔径在垂直于第一方向的第二方向上与工件侧数值孔径不同于掩模的平面 。 可以包括反射型中继光学系统，其包括不产生色差的第一和第二球面镜。

公开(公告)号：US4965630A

公开(公告)日：1990-10-23

申请号：US451166

申请日：1989-12-15

申请人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

发明人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70241

摘要： The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected.

摘要翻译： 本发明提供一种投影曝光装置，包括：标线片台; 照明光学系统，用于照亮标线片台上的掩模版; 支撑衬底的阶段; 以及具有预定数值孔径的投影光学系统，以将形成在标线上的图案投影并由照明光学系统照射到基板上，并且其中将关于在掩模版上形成的图案聚焦到基板上的纵向球面像差 被过度纠正。