公开(公告)号：US20070229837A1

公开(公告)日：2007-10-04

申请号：US11391690

申请日：2006-03-29

申请人： Maurits Schaar ,  Arie Den Boef ,  Everhardus Mos ,  Stefan Antonius Keij

发明人： Maurits Schaar ,  Arie Den Boef ,  Everhardus Mos ,  Stefan Antonius Keij

IPC分类号： G01B9/02

CPC分类号： G03F7/70633 ,  G03F7/70483

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes two reference gratings provided in the substrate and two measurement gratings on top of the reference gratings, the measurement gratings being similar to the reference gratings, and oppositely biased in a single direction relative to the respective reference gratings. An overlay measurement device with an image sensor is used for obtaining pixel data of a measurement spot in each of the two measurement gratings. Asymmetry for each pixel in the measurement spot is measured, and from the pixel asymmetry measurements in associated pixels of each of the two measurement gratings an overlay value and a process dependent value is determined, as well as a quality indicator for the overlay value and the process dependent value.

摘要翻译： 布置成将图案从图案形成装置转移到基板上的光刻设备包括设置在基板中的两个参考光栅和在参考光栅顶部的两个测量光栅，测量光栅类似于参考光栅，并且相反地偏置在单个 相对于各个参考光栅的方向。 使用具有图像传感器的覆盖测量装置来获得两个测量光栅中的每一个中的测量点的像素数据。 测量测量点中每个像素的不对称性，并且从两个测量光栅中的每一个的相关像素中的像素不对称测量结果确定覆盖值和过程相关值，以及重叠值的质量指示符和 过程依赖值。