公开(公告)号：US6099389A

公开(公告)日：2000-08-08

申请号：US166817

申请日：1998-10-05

申请人： Michael A. Nichols ,  David M. Aikens ,  David W. Camp ,  Ian M. Thomas ,  Craig Kiikka ,  Lynn M. Sheehan ,  Mark R. Kozlowski

发明人： Michael A. Nichols ,  David M. Aikens ,  David W. Camp ,  Ian M. Thomas ,  Craig Kiikka ,  Lynn M. Sheehan ,  Mark R. Kozlowski

IPC分类号： B24B1/00 ,  B24B9/14 ,  B24B13/00

CPC分类号： B24B9/14 ,  B24B1/00 ,  B24B13/0037

摘要： A method for forming optical parts used in laser optical systems such as high energy lasers, high average power lasers, semiconductor capital equipment and medical devices. The optical parts will not damage during the operation of high power lasers in the ultra-violet light range. A blank is first ground using a fixed abrasive grinding method to remove the subsurface damage formed during the fabrication of the blank. The next step grinds and polishes the edges and forms bevels to reduce the amount of fused-glass contaminants in the subsequent steps. A loose abrasive grind removes the subsurface damage formed during the fixed abrasive or "blanchard" removal process. After repolishing the bevels and performing an optional fluoride etch, the surface of the blank is polished using a zirconia slurry. Any subsurface damage formed during the loose abrasive grind will be removed during this zirconia polish. A post polish etch may be performed to remove any redeposited contaminants. Another method uses a ceria polishing step to remove the subsurface damage formed during the loose abrasive grind. However, any residual ceria may interfere with the optical properties of the finished part. Therefore, the ceria and other contaminants are removed by performing either a zirconia polish after the ceria polish or a post ceria polish etch.

摘要翻译： 用于形成用于诸如高能激光器，高平均功率激光器，半导体资本设备和医疗设备的激光光学系统中的光学部件的方法。 在紫外光范围内的大功率激光器的操作过程中，光学部件不会损坏。 使用固定的研磨研磨方法首先研磨坯料以去除在坯料制造期间形成的地下损伤。 下一步研磨和抛光边缘并形成斜面以减少随后步骤中熔融玻璃污染物的量。 松散的研磨研磨可消除在固定磨料或“漂白剂”去除过程中形成的地下损伤。 在重新抛光斜面并进行可选的氟化物蚀刻之后，使用氧化锆浆料对坯料的表面进行抛光。 在这种氧化锆抛光期间，在松散研磨研磨过程中形成的任何地下损伤将被去除。 可以进行后抛光蚀刻以去除任何再沉积的污染物。 另一种方法是使用二氧化铈抛光步骤来去除在磨料研磨过程中形成的地下损伤。 然而，任何残留的二氧化铈可能会干扰成品部件的光学性能。 因此，通过在二氧化铈抛光之后进行氧化锆抛光或氧化铈抛光蚀刻来除去二氧化铈和其它污染物。

公开(公告)号：US06518539B2

公开(公告)日：2003-02-11

申请号：US09948444

申请日：2001-09-07

申请人： Lloyd A. Hackel ,  Alan K. Burnham ,  Bernardino M. Penetrante ,  Raymond M. Brusasco ,  Paul J. Wegner ,  Lawrence W. Hrubesh ,  Mark R. Kozlowski ,  Michael D. Feit

发明人： Lloyd A. Hackel ,  Alan K. Burnham ,  Bernardino M. Penetrante ,  Raymond M. Brusasco ,  Paul J. Wegner ,  Lawrence W. Hrubesh ,  Mark R. Kozlowski ,  Michael D. Feit

IPC分类号： B23K2600

CPC分类号： C03C23/002 ,  C03C15/00 ,  C03C23/0025

摘要： The present invention provides a system that mitigates the growth of surface damage in an optic. Damage to the optic is minimally initiated. In an embodiment of the invention, damage sites in the optic are initiated, located, and then treated to stop the growth of the damage sites. The step of initiating damage sites in the optic includes a scan of the optic using a laser to initiate defects. The exact positions of the initiated sites are identified. A mitigation process is performed that locally or globally removes the cause of subsequent growth of the damaged sites.

公开(公告)号：US5472748A

公开(公告)日：1995-12-05

申请号：US597228

申请日：1990-10-15

申请人： C. Robert Wolfe ,  Mark R. Kozlowski ,  John H. Campbell ,  Michael Staggs ,  Frank Rainer

发明人： C. Robert Wolfe ,  Mark R. Kozlowski ,  John H. Campbell ,  Michael Staggs ,  Frank Rainer

IPC分类号： C03C17/245 ,  G02B1/10 ,  G02B1/12 ,  B05D3/06 ,  B05D5/06

CPC分类号： G02B1/12 ,  C03C17/245 ,  G02B1/105 ,  C03C2218/32

摘要： The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold.

摘要翻译： 本发明包括一种具有高激光损伤阈值和所得薄膜的光学薄膜的制造方法。 通过以低于无条件的激光损伤阈值的能量密度照射薄膜，永久地增加薄膜的激光损伤阈值。