公开(公告)号：US20050256331A1

公开(公告)日：2005-11-17

申请号：US10843892

申请日：2004-05-12

申请人： Michael Der Puy ,  Jingji Ma ,  George Samuels ,  Leonard Stachura

发明人： Michael Der Puy ,  Jingji Ma ,  George Samuels ,  Leonard Stachura

IPC分类号： C07F5/02 ,  C07F5/04

CPC分类号： C07F5/04

摘要： Present invention relates to a process for the manufacture of fluorinated alcohols as well as borates which are employed in the manufacture of the fluorinated alcohols. Fluorinated alcohols of the formulae HOCHRCF(CF3)CHFCF(CF3)2 and HOCHRCF(CF(CF3)2)CHFCF3, HOCHRCF(CF2CF3)CH(CF3)2 and HOCHRC(CF3)2CHFCF2CF3 are made by heating a mixture of a borate of the formula (RCH2O)3B, wherein R═H or a C1 to C7 alkyl group, with perfluoro-4-methyl-2-pentene or perfluoro-2-methyl-2-pentene and a free-radical initiator to form a mixture of borates, optionally separating the mixture of borates from any reactants, solvents, and by-products; hydrolyzing the mixture of borates to form a hydrolysis product mixture; and separating the alcohols from the hydrolysis product mixture.

摘要翻译： 本发明涉及用于制造氟化醇的氟化醇以及硼酸盐的方法。 式HOCHRCF（CF 3）CHFCF（CF 3）2和HOCHRCF（CF（CF 3）3）的氟化醇 CH 2 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 CF 3 / SUB> 2 和HOCHRC（CF 3 3）2 CHFCF 2 CF 3 3 / / SUB 通过将式（R CH 2 O 2）3 B B的硼酸盐与其中的RH或C 1 H 2的混合物加热到C 与全氟-4-甲基-2-戊烯或全氟-2-甲基-2-戊烯和自由基引发剂形成硼酸盐的混合物，任选分离硼酸盐混合物 来自任何反应物，溶剂和副产物; 水解硼酸盐混合物以形成水解产物混合物; 并从水解产物混合物中分离醇。

公开(公告)号：US20060008730A1

公开(公告)日：2006-01-12

申请号：US10888732

申请日：2004-07-09

申请人： Michael Puy ,  Haridasan Nair ,  Jingji Ma ,  David Nalewajek ,  Andrew Poss ,  Leonard Stachura ,  Lawrence Ford ,  Dennis Lavery

发明人： Michael Puy ,  Haridasan Nair ,  Jingji Ma ,  David Nalewajek ,  Andrew Poss ,  Leonard Stachura ,  Lawrence Ford ,  Dennis Lavery

IPC分类号： G03C1/492

CPC分类号： G03F7/0046 ,  C07C69/65 ,  C07C69/653 ,  C07C2602/42 ,  G03F7/0395

摘要： Monomers and polymers useful for forming photoresists are provided. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomeric unit which comprises an acid labile group of the formula —OC(CH3)2CF3 and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.

摘要翻译： 提供了可用于形成光致抗蚀剂的单体和聚合物。 更具体地，光致抗蚀剂以及用于微光刻的光致抗蚀剂的单体和聚合物，特别是带有降低光密度的酸不稳定基团的单体。 所得到的光致抗蚀剂显示出对157nm光的改善的透明度。 光致抗蚀剂组合物由至少一种不溶于水的可酸分解聚合物的混合物组成，该聚合物由至少一个单体单元制备，所述单体单元包含式-COC（CH 3 CH 3） 其对于大约157nm的波长的紫外线辐射基本上是透明的，并且至少一个光致酸发生器能够在暴露于足够的活化能的同时产生酸 波长约157nm。

公开(公告)号：US20060008731A1

公开(公告)日：2006-01-12

申请号：US10888746

申请日：2004-07-09

申请人： Michael Van Der Puy ,  Jingji Ma ,  Dennis Lavery ,  Lawrence Ford ,  Haridasan Nair ,  David Nalewajek ,  Andrew Poss ,  Leonard Stachura

发明人： Michael Van Der Puy ,  Jingji Ma ,  Dennis Lavery ,  Lawrence Ford ,  Haridasan Nair ,  David Nalewajek ,  Andrew Poss ,  Leonard Stachura

IPC分类号： G03C1/492

CPC分类号： C07C23/27 ,  C07C17/30 ,  G03F7/0046 ,  G03F7/0395

摘要： Monomers and polymers useful for forming photoresists. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomer having a monomeric unit structure which comprises: where Hal=F, Cl or Br and X=H or F; and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm, and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.

摘要翻译： 用于形成光致抗蚀剂的单体和聚合物。 更具体地，光致抗蚀剂以及用于微光刻的光致抗蚀剂的单体和聚合物，特别是带有降低光密度的酸不稳定基团的单体。 所得到的光致抗蚀剂显示出对157nm光的改善的透明度。 光致抗蚀剂组合物由至少一种不溶于水的可酸分解聚合物的混合物组成，该聚合物由至少一种具有单体单元结构的单体制备，其中Hal = F，Cl或Br，X = H或F; 并且其对于约157nm的波长的紫外线辐射是基本上透明的，以及至少一种能够在暴露于约157nm的波长的足够活化能时产生酸的光酸产生剂。