Low-irritation compositions and methods of making the same
    2.
    发明申请
    Low-irritation compositions and methods of making the same 有权
    低刺激性成分及其制造方法

    公开(公告)号:US20060257348A1

    公开(公告)日:2006-11-16

    申请号:US11429494

    申请日:2006-05-05

    IPC分类号: A61K8/81

    摘要: Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.

    摘要翻译: 提供了包含低分子量聚合物材料和具有降低的刺激性的表面活性剂的组合物,其减少与包含阴离子和/或两性表面活性剂的个人护理组合物相关的刺激的方法,所述方法包括将能够结合的低分子量聚合物 具有阴离子表面活性剂的表面活性剂以产生减少的刺激性个人护理组合物,以及使用这些组合物以降低刺激性来清洁头发或皮肤的方法。

    Low-irritation compositions and methods of making the same
    4.
    发明申请
    Low-irritation compositions and methods of making the same 有权
    低刺激性成分及其制造方法

    公开(公告)号:US20070111910A1

    公开(公告)日:2007-05-17

    申请号:US11429522

    申请日:2006-05-05

    IPC分类号: A61K8/00

    摘要: Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.

    摘要翻译: 提供了包含低分子量聚合物材料和具有降低的刺激性的表面活性剂的组合物,减少与包含阴离子和/或两性表面活性剂的个人护理组合物相关的刺激的方法,所述方法包括将能够结合的低分子量聚合物 具有阴离子表面活性剂的表面活性剂以产生减少的刺激性个人护理组合物,以及使用这些组合物以降低刺激性来清洁头发或皮肤的方法。