公开(公告)号：US5002798A

公开(公告)日：1991-03-26

申请号：US335406

申请日：1989-04-10

申请人： Michael S. Donley ,  Paul T. Murray ,  Trice W. Haas

发明人： Michael S. Donley ,  Paul T. Murray ,  Trice W. Haas

IPC分类号： C10M103/06 ,  C23C14/06 ,  C23C14/28 ,  F16N15/00

CPC分类号： C10M103/06 ,  C23C14/0623 ,  C23C14/28 ,  F16N15/00 ,  C10M2201/065 ,  C10M2201/066 ,  C10N2210/05 ,  C10N2210/06 ,  C10N2240/40 ,  C10N2280/00

摘要： Thin films of solid lubricious metal chalcogenides, such as MoS.sub.2, are grown on stainless steel substrates by pulsed laser evaporation (P.L.E.). X-ray photoelectron spectroscopy of PLE deposited MoS.sub.2 films grown at substrate temperatures up to 300.degree. C. have the same stoichiometry as bulk MoS.sub.2. MoS.sub.2 PLE deposited films grown at 450.degree. C. are sulfur rich. These laser-deposited films have a granular structure and exhibit none of the dendritic structures typically observed in sputter-deposited films. The coefficients of friction of PLE films were measured in laboratory air and ranged from 0.09-0.25; the majority of values were between 0.16 and 0.20. These frictional coefficients are in the appropriate range for a solid lubricant.

摘要翻译： 固体润滑金属硫属化物如MoS2的薄膜通过脉冲激光蒸发（P.L.E.）在不锈钢衬底上生长。 在高达300℃的衬底温度下生长的PLE沉积的MoS 2膜的X射线光电子能谱具有与体MoS2相同的化学计量。 在450℃生长的MoS2 PLE沉积膜是富含硫的。 这些激光沉积膜具有颗粒结构，并且在溅射沉积膜中通常没有观察到树状结构。 在实验室空气中测量PLE膜的摩擦系数，范围为0.09-0.25; 大多数值在0.16和0.20之间。 这些摩擦系数在固体润滑剂的适当范围内。