公开(公告)号：US5973771A

公开(公告)日：1999-10-26

申请号：US824385

申请日：1997-03-26

申请人： Michael Straight Hibbs ,  Dean Craig Humphrey ,  Grant Neven Pealer, III ,  Barbara Bates Peck

发明人： Michael Straight Hibbs ,  Dean Craig Humphrey ,  Grant Neven Pealer, III ,  Barbara Bates Peck

IPC分类号： G03F7/20 ,  G01J1/00 ,  G01J1/32 ,  G01R11/00

CPC分类号： G03F7/70591 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70641

摘要： The invention relates to the evaluation of the pupil illumination profile in a projection lithography system using an imaging reticle featuring a plurality of holes of few microns in diameter. The imaging reticle is placed at the lens object plane and a photoresist coated substrate is exposed in a defocused position from the lithographic image plane. The image reticle has a plurality of identical holes that are regularly spaced at predetermined distances for a more detailed evaluation of the effective pupil illumination across the entire exposure field.

摘要翻译： 本发明涉及使用具有多个直径为几微米孔的成像掩模版的投影光刻系统中的光瞳照明轮廓的评估。 将成像掩模版放置在透镜物平面处，并且将光致抗蚀剂涂覆的基板从光刻图像平面以散焦位置曝光。 图像掩模版具有多个相同的孔，其以预定距离规则地间隔开，以便对整个曝光场的有效光瞳照明进行更详细的评估。