公开(公告)号：US09075317B2

公开(公告)日：2015-07-07

申请号：US14480754

申请日：2014-09-09

Applicant: Micron Technology, Inc.

Inventor： Fei Wang ,  Ezequiel Vidal Russell ,  Chung-Yi Lee

IPC: G03F1/00 ,  G03F1/32 ,  G03F1/26 ,  G03F1/30 ,  G03F1/38 ,  G03F1/68

CPC classification number: G03F1/32 ,  G03F1/00 ,  G03F1/26 ,  G03F1/30 ,  G03F1/36 ,  G03F1/38 ,  G03F1/68

Abstract: A photomask includes a substrate having a device region and an adjacent edge region over transparent material. The device region includes spaced primary features of constant pitch at least adjacent the edge region. The edge region includes spaced sub-resolution assist features of the constant pitch of the spaced primary features at least adjacent the device region and which are off-phase by from about 30° to about 150° from +/−180°. Additional embodiments, including methods, are disclosed.

Abstract translation: 光掩模包括具有在透明材料上的器件区域和相邻边缘区域的衬底。 器件区域包括至少邻近边缘区域的恒定间距的间隔的主要特征。 边缘区域包括间隔开的主要特征的至少相邻于器件区域的恒定间距的间隔的次分辨率辅助特征，并且与+/- 180°相差约30°至约150°。 公开了包括方法的其它实施例。

公开(公告)号：US20150017575A1

公开(公告)日：2015-01-15

申请号：US14480754

申请日：2014-09-09

Applicant: Micron Technology, Inc.

Inventor： Fei Wang ,  Ezequiel Vidal Russell ,  Chung-Yi Lee

IPC: G03F1/32 ,  G03F1/26

CPC classification number: G03F1/32 ,  G03F1/00 ,  G03F1/26 ,  G03F1/30 ,  G03F1/36 ,  G03F1/38 ,  G03F1/68

Abstract: A photomask includes a substrate having a device region and an adjacent edge region over transparent material. The device region includes spaced primary features of constant pitch at least adjacent the edge region. The edge region includes spaced sub-resolution assist features of the constant pitch of the spaced primary features at least adjacent the device region and which are off-phase by from about 30° to about 150° from +/−180°. Additional embodiments, including methods, are disclosed.

Abstract translation: 光掩模包括具有在透明材料上的器件区域和相邻边缘区域的衬底。 器件区域包括至少邻近边缘区域的恒定间距的间隔的主要特征。 边缘区域包括间隔开的主要特征的至少相邻于器件区域的恒定间距的间隔的次分辨率辅助特征，并且与+/- 180°相差约30°至约150°。 公开了包括方法的其它实施例。