Devices for controlling electron emission in plasma flood system
    1.
    发明授权
    Devices for controlling electron emission in plasma flood system 失效
    用于控制等离子体洪水系统中电子发射的装置

    公开(公告)号:US06822395B2

    公开(公告)日:2004-11-23

    申请号:US10233842

    申请日:2002-09-03

    IPC分类号: H01J724

    CPC分类号: H01J37/3171 H01J2237/0041

    摘要: A device for controlling emission of electrons from an arc chamber of a plasma flood system into an ion beam in an ion implanter for implanting ions into a substrate. In one embodiment, the invention comprises a mechanical shutter disposed in a discharge opening between the arc chamber and the plasma guide tube of the implanter. The bore size of the shutter can be selectively varied in order to control the emission of electrons from the arc chamber into the ion beam in the plasma guide tube. In another embodiment, the invention comprises an electron-attracting probe which is disposed in the discharge opening.

    摘要翻译: 一种用于控制从等离子体放电系统的电弧室将电子发射到用于将离子注入到衬底中的离子注入机中的离子束的装置。 在一个实施例中,本发明包括设置在电弧室和注入机的等离子体引导管之间的排放口中的机械快门。 可以选择性地改变快门的孔尺寸,以便控制从电弧室到等离子体引导管中的离子束的电子的发射。 在另一个实施例中,本发明包括设置在排出口中的吸电子探针。