Positive photoresist composition
    1.
    发明授权
    Positive photoresist composition 失效
    正光致抗蚀剂组合物

    公开(公告)号:US06680155B2

    公开(公告)日:2004-01-20

    申请号:US10328014

    申请日:2002-12-26

    IPC分类号: G03F7023

    CPC分类号: G03F7/022

    摘要: A composition includes (A) an alkali-soluble resin; and (B) (b-1) a compound of Formula (I): wherein Ds are each a hydrogen atom or a naphthoquinonediazidosulfonyl group; and (b2) a quinonediazide ester of, for example, bis(2-methyl-4-hydroxy-5-cyclohexylphenyl)-3,4-dihydroxyphenylmethane.

    摘要翻译: 组合物包括(A)碱溶性树脂; 和(B)(b-1)式(I)的化合物:其中Ds各自为氢原子或萘醌二叠氮基磺酰基; 和(b2)例如双(2-甲基-4-羟基-5-环己基苯基)-3,4-二羟基苯基甲烷的醌二叠氮化物酯。

    Positive photoresist composition
    2.
    发明授权
    Positive photoresist composition 失效
    正光致抗蚀剂组合物

    公开(公告)号:US06630279B2

    公开(公告)日:2003-10-07

    申请号:US10327361

    申请日:2002-12-26

    IPC分类号: G03F7023

    CPC分类号: G03F7/022

    摘要: A composition includes (A) an alkali-soluble resin; and (B) (b-1) a compound of Formula (I): wherein Ds are each a hydrogen atom or a naphthoquinonediazidosulfonyl group; and (b2) a quinonediazide ester of, for example, methyl gallate.

    摘要翻译: 组合物包括(A)碱溶性树脂; 和(B)(b-1)式(I)的化合物:其中Ds各自为氢原子或萘醌二叠氮基磺酰基; 和(b2)例如没食子酸甲酯的醌二叠氮化物酯。

    Novolak resin, production process thereof and positive photoresist composition using the novolak resin
    3.
    发明授权
    Novolak resin, production process thereof and positive photoresist composition using the novolak resin 失效
    酚醛清漆树脂,其制备方法和使用酚醛清漆树脂的正性光致抗蚀剂组合物

    公开(公告)号:US06730769B2

    公开(公告)日:2004-05-04

    申请号:US10135769

    申请日:2002-05-01

    IPC分类号: C08G1404

    摘要: (i) As a primary reaction, m-cresol is allowed to react with propionaldehyde in the presence of an acid catalyst and thereby yields a polymer having a weight average molecular weight Mw of 200 to 500 and a molecular weight distribution Mw/Mn of 1.7 or less, and (ii) as a secondary reaction, the polymer is allowed to react with 3,4-xylenol and formaldehyde and thereby yields a novolak resin having an Mw of 1000 to 20000. By adding a specific photosensitizer, the novolak resin yields a positive photoresist composition.

    摘要翻译: (i)作为主要反应,使间甲酚在酸催化剂存在下与丙醛反应,由此得到重均分子量Mw为200〜500,分子量分布Mw / Mn为1.7的聚合物 或更少,和(ii)作为二次反应,使聚合物与3,4-二甲苯酚和甲醛反应,从而得到Mw为1000-20000的酚醛清漆树脂。通过加入特定的光敏剂,酚醛清漆树脂产生 正性光致抗蚀剂组合物。