公开(公告)号：US20110020966A1

公开(公告)日：2011-01-27

申请号：US12839301

申请日：2010-07-19

申请人： Mitsuru Chida ,  Keiji Edamatsu ,  Toshiyasu Sakai ,  Jun Yamamuro

发明人： Mitsuru Chida ,  Keiji Edamatsu ,  Toshiyasu Sakai ,  Jun Yamamuro

IPC分类号： H01L21/306

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1645

摘要： A method for processing a silicon substrate includes preparing a first silicon substrate including an etching mask layer including first and second opening portions; forming a first recess in a portion of the silicon substrate corresponding to a region in the first opening portion; etching the silicon substrate by crystal anisotropic etching through the etching mask layer with an etching apparatus and an etchant, the etching proceeding in the first and second opening portions to form a through hole in a position corresponding to the first opening portion and to form a second recess in a position corresponding to the second opening portion; calculating an etching rate of the silicon substrate in terms of the etchant by using the second recess; and determining, by using the calculated etching rate, an etching condition for etching another silicon substrate with the etching apparatus after the etching of the first silicon substrate.

摘要翻译： 一种处理硅衬底的方法包括：制备包含第一和第二开口部分的蚀刻掩模层的第一硅衬底; 在所述硅衬底的与所述第一开口部分中的区域相对应的部分中形成第一凹部; 通过蚀刻装置和蚀刻剂通过蚀刻掩模层通过晶体各向异性蚀刻来蚀刻硅衬底，蚀刻在第一和第二开口部分中进行，以在对应于第一开口部分的位置形成通孔，并形成第二 在与第二开口部相对应的位置处凹陷; 通过使用第二凹槽计算蚀刻剂方面的硅衬底的蚀刻速率; 以及通过使用所计算的蚀刻速率，在蚀刻所述第一硅衬底之后，使用所述蚀刻装置来确定用于蚀刻另一硅衬底的蚀刻条件。

公开(公告)号：US08430476B2

公开(公告)日：2013-04-30

申请号：US13456977

申请日：2012-04-26

申请人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

发明人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

IPC分类号： B41J2/015 ,  B41J2/135 ,  B41J2/16

CPC分类号： B41J2/1603 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645

摘要： A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure.

摘要翻译： 一种液体排出头的制造方法，该喷液头具有由氮化硅构成的层和配置在由氮化硅构成的层的上方的具有喷出口形成部件的基板的液体排出头，具有排出液体的排出口。 该方法包括将作为排出口形成部件的感光层设置在由氮化硅制成的层上方，并通过将感光层曝光于i线而形成排出口。 由氮化硅制成的层对于波长为633nm的光具有2.05以上的折射率，并且在曝光中进行i线的照射。

公开(公告)号：US20120206535A1

公开(公告)日：2012-08-16

申请号：US13456977

申请日：2012-04-26

申请人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

发明人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

IPC分类号： B41J2/015

CPC分类号： B41J2/1603 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645

摘要： A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure.

摘要翻译： 一种液体排出头的制造方法，该喷液头具有由氮化硅构成的层和配置在由氮化硅构成的层的上方的具有喷出口形成部件的基板的液体排出头，具有排出液体的排出口。 该方法包括将作为排出口形成部件的感光层设置在由氮化硅制成的层上方，并通过将感光层曝光于i线而形成排出口。 由氮化硅制成的层对于波长为633nm的光具有2.05以上的折射率，并且在曝光中进行i线的照射。

公开(公告)号：US08187898B2

公开(公告)日：2012-05-29

申请号：US12339047

申请日：2008-12-19

申请人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

发明人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

IPC分类号： B41J2/16

CPC分类号： B41J2/1603 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645

摘要： A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure.

摘要翻译： 一种液体排出头的制造方法，该喷液头具有由氮化硅构成的层和配置在由氮化硅构成的层的上方的具有喷出口形成部件的基板的液体排出头，具有排出液体的排出口。 该方法包括将作为排出口形成部件的感光层设置在由氮化硅制成的层上方，并通过将感光层曝光于i线而形成排出口。 由氮化硅制成的层对于波长为633nm的光具有2.05以上的折射率，并且在曝光中进行i线的照射。

公开(公告)号：US20100003773A1

公开(公告)日：2010-01-07

申请号：US12339047

申请日：2008-12-19

申请人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

发明人： Jun Yamamuro ,  Masaki Ohsumi ,  Masahisa Watanabe ,  Keiji Edamatsu

IPC分类号： H01L21/30

CPC分类号： B41J2/1603 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645

摘要： A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure.

摘要翻译： 一种液体排出头的制造方法，该喷液头具有由氮化硅构成的层和配置在由氮化硅构成的层的上方的具有喷出口形成部件的基板的液体排出头，具有排出液体的排出口。 该方法包括将作为排出口形成部件的感光层设置在由氮化硅制成的层上方，并通过将感光层曝光于i线而形成排出口。 由氮化硅制成的层对于波长为633nm的光具有2.05以上的折射率，并且在曝光中进行i线的照射。

公开(公告)号：US20110167636A1

公开(公告)日：2011-07-14

申请号：US12983505

申请日：2011-01-03

申请人： Keiji Edamatsu ,  Yoshinori Tagawa ,  Kazuhiro Asai ,  Satoshi Ibe ,  Hiroto Komiyama ,  Toshiaki Kurosu ,  Masataka Nagai

发明人： Keiji Edamatsu ,  Yoshinori Tagawa ,  Kazuhiro Asai ,  Satoshi Ibe ,  Hiroto Komiyama ,  Toshiaki Kurosu ,  Masataka Nagai

IPC分类号： B21D53/00

CPC分类号： B41J2/1603 ,  B41J2/162 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1645 ,  B41J2002/14475 ,  B41J2202/11 ,  Y10T29/42 ,  Y10T29/49401

摘要： There is disclosed a manufacturing method of a liquid discharge head including a substrate in which a first energy generating element and a second energy generating element that generate energy used for discharging liquid are provided, a discharge port member in which a first discharge port discharging the liquid is provided corresponding to the first energy generating element and a second discharge port discharging the liquid is provided corresponding to the second energy generating element, and a flow path wall member having a portion of the liquid flow path wall that communicates with the first discharge port and the second discharge port, in which a distance between the second energy generating element and the second discharge port is larger than that between the first energy generating element and the first discharge port.

摘要翻译： 公开了一种液体排出头的制造方法，该液体排出头包括：基材，其中设置有产生用于排出液体的能量的第一能量产生元件和第二能量产生元件;排出口构件，其中排出液体的第一排出口 对应于第一能量产生元件设置并且排出液体的第二排出口对应于第二能量产生元件设置;流路壁构件，其具有与第一排出口连通的液体流路壁的一部分， 第二排出口，其中第二能量产生元件和第二排出口之间的距离大于第一能量产生元件和第一排出口之间的距离。

公开(公告)号：US20120028384A1

公开(公告)日：2012-02-02

申请号：US13191023

申请日：2011-07-26

申请人： Kouji Sasaki ,  Kazuhiro Asai ,  Keiji Edamatsu ,  Yoshinori Tagawa

发明人： Kouji Sasaki ,  Kazuhiro Asai ,  Keiji Edamatsu ,  Yoshinori Tagawa

IPC分类号： H01L21/3065

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2002/14475

摘要： A method for manufacturing a liquid-ejection head having a plurality of nozzles arranged to eject liquid includes: preparing a substrate having a first layer, a second layer, and a third layer stacked in this order, the second layer more resistant than the third layer to etching by an etching method to be used on the third layer; partially etching the third layer by the etching method to expose the second layer; and removing the exposed second layer at least in part to expose some area on the top surface of the first layer, opening a first one of the nozzles down from the exposed area of the top surface, and opening a second one of the nozzles down from the top surface of the third layer.

摘要翻译： 一种液体喷射头的制造方法，具有喷出液体的多个喷嘴，其特征在于，具备：具有依次层叠的具有第一层，第二层和第三层的基板，所述第二层比第三层更具抗性 通过在第三层上使用的蚀刻方法进行蚀刻; 通过蚀刻方法部分地蚀刻第三层以暴露第二层; 以及至少部分地去除所述暴露的第二层以暴露所述第一层的顶表面上的一些区域，从所述顶表面的暴露区域向下打开所述喷嘴中的第一个，并将所述喷嘴中的第二个向下打开 第三层的顶面。

公开(公告)号：US08338195B2

公开(公告)日：2012-12-25

申请号：US13191023

申请日：2011-07-26

申请人： Koji Sasaki ,  Kazuhiro Asai ,  Keiji Edamatsu ,  Yoshinori Tagawa

发明人： Koji Sasaki ,  Kazuhiro Asai ,  Keiji Edamatsu ,  Yoshinori Tagawa

IPC分类号： H01L21/00

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2002/14475

摘要： A method for manufacturing a liquid-ejection head having a plurality of nozzles arranged to eject liquid includes: preparing a substrate having a first layer, a second layer, and a third layer stacked in this order, the second layer more resistant than the third layer to etching by an etching method to be used on the third layer; partially etching the third layer by the etching method to expose the second layer; and removing the exposed second layer at least in part to expose some area on the top surface of the first layer, opening a first one of the nozzles down from the exposed area of the top surface, and opening a second one of the nozzles down from the top surface of the third layer.

摘要翻译： 一种液体喷射头的制造方法，具有喷出液体的多个喷嘴，其特征在于，具备：具有依次层叠的具有第一层，第二层和第三层的基板，所述第二层比第三层更具抗性 通过在第三层上使用的蚀刻方法进行蚀刻; 通过蚀刻方法部分地蚀刻第三层以暴露第二层; 以及至少部分地去除所述暴露的第二层以暴露所述第一层的顶表面上的一些区域，从所述顶表面的暴露区域向下打开所述喷嘴中的第一个，并将所述喷嘴中的第二个向下打开 第三层的顶面。

公开(公告)号：US08286351B2

公开(公告)日：2012-10-16

申请号：US12983505

申请日：2011-01-03

申请人： Keiji Edamatsu ,  Yoshinori Tagawa ,  Kazuhiro Asai ,  Satoshi Ibe ,  Hiroto Komiyama ,  Toshiaki Kurosu ,  Masataka Nagai

发明人： Keiji Edamatsu ,  Yoshinori Tagawa ,  Kazuhiro Asai ,  Satoshi Ibe ,  Hiroto Komiyama ,  Toshiaki Kurosu ,  Masataka Nagai

IPC分类号： B21D53/76 ,  B23P17/00

CPC分类号： B41J2/1603 ,  B41J2/162 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1645 ,  B41J2002/14475 ,  B41J2202/11 ,  Y10T29/42 ,  Y10T29/49401

摘要： There is disclosed a manufacturing method of a liquid discharge head including a substrate in which a first energy generating element and a second energy generating element that generate energy used for discharging liquid are provided, a discharge port member in which a first discharge port discharging the liquid is provided corresponding to the first energy generating element and a second discharge port discharging the liquid is provided corresponding to the second energy generating element, and a flow path wall member having a portion of the liquid flow path wall that communicates with the first discharge port and the second discharge port, in which a distance between the second energy generating element and the second discharge port is larger than that between the first energy generating element and the first discharge port.

摘要翻译： 公开了一种液体排出头的制造方法，该液体排出头包括：基材，其中设置有产生用于排出液体的能量的第一能量产生元件和第二能量产生元件;排出口构件，其中排出液体的第一排出口 对应于第一能量产生元件设置并且排出液体的第二排出口对应于第二能量产生元件设置;流路壁构件，其具有与第一排出口连通的液体流路壁的一部分， 第二排出口，其中第二能量产生元件和第二排出口之间的距离大于第一能量产生元件和第一排出口之间的距离。

公开(公告)号：US08771792B2

公开(公告)日：2014-07-08

申请号：US13013144

申请日：2011-01-25

申请人： Kazuhiro Asai ,  Yoshinori Tagawa ,  Satoshi Ibe ,  Hiroyuki Murayama ,  Kouji Sasaki ,  Keiji Edamatsu

发明人： Kazuhiro Asai ,  Yoshinori Tagawa ,  Satoshi Ibe ,  Hiroyuki Murayama ,  Kouji Sasaki ,  Keiji Edamatsu

IPC分类号： B41J2/16

CPC分类号： B41J2/1603 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1645

摘要： Provided is a method for manufacturing a liquid discharge head, the liquid discharge head includes a substrate provided on a surface with a first energy generating part and a second energy generating part for generating energy utilized for discharging a liquid; a first discharge port provided corresponding to the first energy generating part so as to face the surface; a second discharge port provided corresponding to the second energy generating part so as to face the surface; a first wall member which has a wall of a first liquid flow path which communicates with the first discharge port; and a second wall member which has a wall of a second liquid flow path which communicates the second discharge port, wherein a distance between the second energy generating part and the second discharge port is greater than a distance between the first energy generating part and the first discharge port.

摘要翻译： 本发明提供一种液体排出头的制造方法，该液体排出头包括：在表面上设置有第一能量产生部的基板和产生用于排出液体的能量的第二能量产生部; 第一排出口，与所述第一能量产生部对应地设置成面对所述表面; 第二排出口，与所述第二能量产生部件相对应地设置成面对所述表面; 第一壁构件，其具有与第一排出口连通的第一液体流路的壁; 以及第二壁构件，其具有连通所述第二排出口的第二液流通道的壁，其中所述第二能量产生部和所述第二排出口之间的距离大于所述第一能量产生部和所述第一排出口之间的距离 排气口。