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公开(公告)号:US6077353A
公开(公告)日:2000-06-20
申请号:US88759
申请日:1998-06-02
申请人: Mohamed A. Al-Sharif , Bradley O. Stimson , Debabrata Ghosh , Barney M. Cohen , Kenny King-Tai Ngan , Murali Narasimhan
发明人: Mohamed A. Al-Sharif , Bradley O. Stimson , Debabrata Ghosh , Barney M. Cohen , Kenny King-Tai Ngan , Murali Narasimhan
IPC分类号: H01J37/20 , H01L21/00 , H01L21/302 , H01L21/3065 , H01L21/683 , B05C13/02
CPC分类号: H01L21/67069 , H01J2237/022
摘要: The invention generally provides an apparatus that reduces backside sputtering of the substrate in a pre-clean chamber and other etch chambers. The invention also provides an apparatus that reduces flaking of material from the film formed on the surfaces of the process kit and extends the specified lifetime of a process kit. One aspect of the invention provides an apparatus for supporting a substrate, comprising a support pedestal contacting a central portion of the substrate and an insulator surrounding the support pedestal, the insulator having a beveled portion extending from a circumferential edge of the substrate.
摘要翻译: 本发明通常提供了一种在预清洁室和其它蚀刻室中减少衬底的背面溅射的装置。 本发明还提供了一种减少材料从处理套件表面上形成的膜剥落并延长处理套件规定寿命的装置。 本发明的一个方面提供一种用于支撑衬底的装置,包括接触衬底的中心部分的支撑座和围绕支撑座的绝缘体,绝缘体具有从衬底的周缘延伸的斜面部分。