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公开(公告)号：US20190317399A1
公开(公告)日：2019-10-17
申请号：US16455182
申请日：2019-06-27
IPC分类号： G03F7/00 , G03F7/16 , G02F1/1339
摘要： An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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公开(公告)号：US20180217495A1
公开(公告)日：2018-08-02
申请号：US15885294
申请日：2018-01-31
CPC分类号： G03F7/0002 , G02B5/1857 , G02B2207/101 , G02F1/13394 , G02F2001/13398 , G03F7/0005 , G03F7/168
摘要： An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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公开(公告)号：US11237479B2
公开(公告)日：2022-02-01
申请号：US16920042
申请日：2020-07-02
IPC分类号： G03F7/00 , G03F7/16 , G02B5/18 , G02F1/1339
摘要： An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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公开(公告)号：US10747108B2
公开(公告)日：2020-08-18
申请号：US16455182
申请日：2019-06-27
IPC分类号： G03F7/00 , G03F7/16 , G02B5/18 , G02F1/1339
摘要： An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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公开(公告)号：US20200333705A1
公开(公告)日：2020-10-22
申请号：US16920042
申请日：2020-07-02
IPC分类号： G03F7/00 , G03F7/16 , G02B5/18 , G02F1/1339
摘要： An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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公开(公告)号：US10379438B2
公开(公告)日：2019-08-13
申请号：US15885294
申请日：2018-01-31
IPC分类号： G02F1/1339 , G03F7/16 , G03F7/00 , G02B5/18
摘要： An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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