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公开(公告)号：US12194696B2
公开(公告)日：2025-01-14
申请号：US18364633
申请日：2023-08-03
Applicant: Molecular Imprints, Inc.
Inventor： Sharad D. Bhagat , Christophe Peroz , Vikramjit Singh , Frank Y. Xu
IPC: B29D11/00 , B29C33/62 , G02B1/04 , B29K33/04 , B29K105/00 , B29K105/16 , B29K283/00 , B29K509/02
Abstract: Fabricating a high refractive index photonic device includes disposing a polymerizable composition on a first surface of a first substrate and contacting the polymerizable composition with a first surface of a second substrate, thereby spreading the polymerizable composition on the first surface of the first substrate. The polymerizable composition is cured to yield a polymeric structure having a first surface in contact with the first surface of the first substrate, a second surface opposite the first surface of the polymeric structure and in contact with the first surface of the second substrate, and a selected residual layer thickness between the first surface of the polymeric structure and the second surface of the polymeric structure in the range of 10 μm to 1 cm. The polymeric structure is separated from the first substrate and the second substrate to yield a monolithic photonic device having a refractive index of at least 1.6.
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公开(公告)号：US20220035091A1
公开(公告)日：2022-02-03
申请号：US17451366
申请日：2021-10-19
Applicant: Molecular Imprints, Inc.
Inventor： Frank Y. Xu , Michael Nevin Miller , Kang Luo , Vikramjit Singh , Michael Klug
IPC: F21V8/00
Abstract: A multi-waveguide optical structure, including multiple waveguides stacked to intercept light passing sequentially through each waveguide, each waveguide associated with a differing color and a differing depth of plane, each waveguide including: a first adhesive layer, a substrate having a first index of refraction, and a patterned layer positioned such that the first adhesive layer is between the patterned layer and the substrate, the first adhesive layer providing adhesion between the patterned layer and the substrate, the patterned layer having a second index of refraction less than the first index of refraction, the patterned layer defining a diffraction grating, wherein a field of view associated with the waveguide is based on the first and the second indices of refraction.
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公开(公告)号：US20200333705A1
公开(公告)日：2020-10-22
申请号：US16920042
申请日：2020-07-02
Applicant: Molecular Imprints, Inc.
Inventor： Vikramjit Singh , Michael N. Miller , Frank Y. Xu , Christopher Fleckenstein
IPC: G03F7/00 , G03F7/16 , G02B5/18 , G02F1/1339
Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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公开(公告)号：US20200033609A1
公开(公告)日：2020-01-30
申请号：US16591147
申请日：2019-10-02
Applicant: Molecular Imprints, Inc.
Inventor： Kang Luo , Vikramjit Singh , Frank Y. Xu
Abstract: A method of generating a virtual image, including directing a light beam to a first side of an eyepiece, including transmitting the light beam into a first waveguide of the eyepiece; deflecting, by first diffractive elements of the first waveguide, a first portion of the light beam towards a second waveguide of the eyepiece, the first portion of the light beam associated with a first phase of light; deflecting, by protrusions on the first side of the eyepiece, a second portion of the light beam towards the second waveguide, the second portion of the light beam associated with a second phase of light differing from the first phase; and deflecting, by second diffractive elements of the second waveguide, some of the first and the second portions of the light beam to provide an exiting light beam associated with the virtual image that is based on the first and second phases.
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公开(公告)号：US20190302611A1
公开(公告)日：2019-10-03
申请号：US16356836
申请日：2019-03-18
Applicant: Molecular Imprints, Inc.
Inventor： Vikramjit Singh , Kang Luo , Michael Nevin Miller , Shuqiang Yang , Frank Y. Xu
Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.
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Patent Agency Ranking
公开(公告)号：US10379438B2
公开(公告)日：2019-08-13
申请号：US15885294
申请日：2018-01-31
Applicant: Molecular Imprints, Inc.
Inventor： Vikramjit Singh , Michael N. Miller , Frank Y. Xu , Christopher Fleckenstein
IPC: G02F1/1339 , G03F7/16 , G03F7/00 , G02B5/18
Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
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公开(公告)号：US20180149870A1
公开(公告)日：2018-05-31
申请号：US15724670
申请日：2017-10-04
Applicant: Molecular Imprints, Inc.
Inventor： Kang Luo , Vikramjit Singh , Frank Y. Xu
Abstract: A method of generating a virtual image, including directing a light beam to a first side of an eyepiece, including transmitting the light beam into a first waveguide of the eyepiece; deflecting, by first diffractive elements of the first waveguide, a first portion of the light beam towards a second waveguide of the eyepiece, the first portion of the light beam associated with a first phase of light; deflecting, by protrusions on the first side of the eyepiece, a second portion of the light beam towards the second waveguide, the second portion of the light beam associated with a second phase of light differing from the first phase; and deflecting, by second diffractive elements of the second waveguide, some of the first and the second portions of the light beam to provide an exiting light beam associated with the virtual image that is based on the first and second phases.
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公开(公告)号：US20180149796A1
公开(公告)日：2018-05-31
申请号：US15705838
申请日：2017-09-15
Applicant: Molecular Imprints, Inc.
Inventor： Frank Y. Xu , Michael Nevin Miller , Kang Luo , Vikramjit Singh , Michael Klug
IPC: F21V8/00
CPC classification number: G02B6/0038 , G02B1/11 , G02B6/0065 , G02B6/0076 , G02B27/4205 , G02B27/4272
Abstract: A multi-waveguide optical structure, including multiple waveguides stacked to intercept light passing sequentially through each waveguide, each waveguide associated with a differing color and a differing depth of plane, each waveguide including: a first adhesive layer, a substrate having a first index of refraction, and a patterned layer positioned such that the first adhesive layer is between the patterned layer and the substrate, the first adhesive layer providing adhesion between the patterned layer and the substrate, the patterned layer having a second index of refraction less than the first index of refraction, the patterned layer defining a diffraction grating, wherein a field of view associated with the waveguide is based on the first and the second indices of refraction.
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公开(公告)号：US20140319727A1
公开(公告)日：2014-10-30
申请号：US14247874
申请日：2014-04-08
Inventor： Sidlgata V. Sreenivasan , Vikramjit Singh , Frank Y. Xu , Byung-Jin Choi
IPC: B29C59/02
CPC classification number: B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
Abstract: Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
Abstract translation: 描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。 该方法可以用于直接图案化衬底和/或创建压印光刻模板或模具，其可以随后用于将纳米形图案直接复制到其它衬底中，例如形成功能性或牺牲抗蚀剂以形成功能纳米颗粒。
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公开(公告)号：US20220390836A1
公开(公告)日：2022-12-08
申请号：US17819711
申请日：2022-08-15
Applicant: Molecular Imprints, Inc.
Inventor： Vikramjit Singh
Abstract: Asymmetric structures formed on a substrate and microlithographic methods for forming such structures. Each of the structures has a first side surface and a second side surface, opposite the first side surface. A profile of the first side surface is asymmetric with respect to a profile of the second side surface. The structures on the substrate are useful as a diffraction pattern for an optical device.
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