PLANAR FILAMENT WITH DIRECTED ELECTRON BEAM
    1.
    发明公开

    公开(公告)号:US20230360876A1

    公开(公告)日:2023-11-09

    申请号:US18340690

    申请日:2023-06-23

    Applicant: Moxtek, Inc.

    Inventor: Eric MILLER

    CPC classification number: H01J35/064

    Abstract: A planar filament 11f can include multiple materials to increase electron emission in desired directions and to suppress electron emission in undesired directions. The filament 11f can include a core-material CM between a top-material TM and a bottom-material BM. The top-material TM can have a lowest work function WFt; the bottom-material BM can have a highest work function WFb; and the core-material CM can have an intermediate work function WFc (WFt Wb). This shape makes it easier to coat the edges 31e with the bottom-material BM, because the edges 31e tilt toward and partially face the sputter target. This shape also helps direct more electrons to a center of the target 14, and reduce electron emission in undesired directions.

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