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44 条记录 (耗时 0.043 秒)

    Micro-lens array and manufacturing method thereof
    1.
    发明授权
    Micro-lens array and manufacturing method thereof 失效
    微透镜阵列及其制造方法

    公开(公告)号：US07351520B2

    公开(公告)日：2008-04-01

    申请号：US10928171

    申请日：2004-08-30

    申请人： Myung-bok Lee ,  Jin-seung Shon ,  Mee-suk Jung ,  Eun-hyoung Cho ,  Hae-sung Kim

    发明人： Myung-bok Lee ,  Jin-seung Shon ,  Mee-suk Jung ,  Eun-hyoung Cho ,  Hae-sung Kim

    IPC分类号： G02B3/00

    CPC分类号： G02B3/0031 ,  B29D11/00278 ,  G02B5/1852 ,  G02B5/1885 ,  G02B13/0085

    摘要： A micro-lens array and manufacturing method. A hybrid micro-lens in which a refractive lens and a diffraction lens are formed includes: a refractive lens; a first ultraviolet hardening material which is bonded on a curved surface of the refractive lens to form an aspheric surface; a support substrate including a concave portion into which the refractive lens is inserted and supported; and a diffraction lens which is formed at a position corresponding to the refractive lens disposed on the support substrate.

    摘要翻译： 微透镜阵列及其制造方法。 其中形成折射透镜和衍射透镜的混合微透镜包括：折射透镜; 第一紫外线硬化材料，其结合在折射透镜的弯曲表面上以形成非球面; 支撑基板，其包括凹部，折射透镜插入并支撑在该凹部中; 以及形成在与设置在支撑基板上的折射透镜相对应的位置的衍射透镜。

    Integrated optical pickup and optical recording and/or reproducing apparatus using the same
    4.
    发明授权
    Integrated optical pickup and optical recording and/or reproducing apparatus using the same 失效
    集成光学拾取器和使用其的光学记录和/或再现装置

    公开(公告)号：US07428194B2

    公开(公告)日：2008-09-23

    申请号：US10986838

    申请日：2004-11-15

    申请人： Jin-seung Sohn ,  Myung-bok Lee ,  Mee-suk Jung ,  Eun-hyoung Cho ,  Hae-sung Kim

    发明人： Jin-seung Sohn ,  Myung-bok Lee ,  Mee-suk Jung ,  Eun-hyoung Cho ,  Hae-sung Kim

    IPC分类号： G11B7/00

    CPC分类号： G11B7/1378 ,  G11B7/124 ,  G11B7/1353

    摘要： An optical pickup and an optical recording and/or reproducing apparatus using the optical pickup are provided. The optical pickup includes: a light source; an optical bench on which the light source is mounted; a focusing member including an objective lens, focusing light emitted from the light source to form a light spot on an optical information storage medium; and an optical path forming member having a transparent block that includes a light entrance/exit surface on which the optical bench and the focusing member are arranged, a first reflection surface, and a second reflection surface opposing the first reflection surface, where the optical path forming member directs the light emitted from the light source toward the objective lens by reflecting the light emitted from the light source on the first and second reflection surfaces. The optical pickup satisfies the requirement for smaller, slimmer design and can be integrated using semiconductor manufacturing processes.

    摘要翻译： 提供了使用光学拾取器的光学拾取器和光学记录和/或再现装置。 光学拾取器包括：光源; 安装光源的光台; 聚焦构件，包括物镜，聚焦从光源发射的光以在光学信息存储介质上形成光斑; 以及具有透明块的光路形成构件，所述透光块包括配置有所述光学台和所述聚焦构件的光入射/出射面，第一反射面和与所述第一反射面相对的第二反射面， 成形构件通过将从光源发射的光反射在第一和第二反射面上而将从光源发射的光朝向物镜引导。 光学拾取器满足更小，更薄的设计的要求，并且可以使用半导体制造工艺进行集成。

    Method of exposing using electron beam
    5.
    发明授权
    Method of exposing using electron beam 有权
    使用电子束曝光的方法

    公开(公告)号：US07154105B2

    公开(公告)日：2006-12-26

    申请号：US11066187

    申请日：2005-02-25

    申请人： Hae-sung Kim ,  Myung-bok Lee ,  Jin-seung Sohn ,  Mee-suk Jung ,  Eun-hyoung Cho

    发明人： Hae-sung Kim ,  Myung-bok Lee ,  Jin-seung Sohn ,  Mee-suk Jung ,  Eun-hyoung Cho

    IPC分类号： H01J37/08

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  Y10S430/143

    摘要： Provided is a method of exposing using an electron beam. The provided method of exposing using the electron beam includes defining main fields on an exposure area of an electron beam exposure target and defining a plurality of sub-fields on the main fields, selecting a main field to be exposed, selecting at least one sub-field of the selected main field, exposing the selected sub-field by using the electron beam, and selecting at least one of the other sub-field, which is not adjacent to the previously selected sub-field and not exposed yet, and exposing the sub-field by using the electron beam.

    摘要翻译： 提供了使用电子束曝光的方法。 所提供的使用电子束曝光的方法包括限定在电子束曝光目标的曝光区域上的主场，并且在主场上定义多个子场，选择要曝光的主场，选择至少一个子场， 选择的主场的场，通过使用电子束曝光所选择的子场，并且选择与先前选择的子场不相邻并且不暴露的另一个子场中的至少一个，并且将 子场通过使用电子束。

    Integrated optical pickup and optical recording and/or reproducing apparatus using the same
    6.
    发明申请
    Integrated optical pickup and optical recording and/or reproducing apparatus using the same 失效
    集成光学拾取器和使用其的光学记录和/或再现装置

    公开(公告)号：US20050105406A1

    公开(公告)日：2005-05-19

    申请号：US10986838

    申请日：2004-11-15

    申请人： Jin-seung Sohn ,  Myung-bok Lee ,  Mee-suk Jung ,  Eun-hyoung Cho ,  Hae-sung Kim

    发明人： Jin-seung Sohn ,  Myung-bok Lee ,  Mee-suk Jung ,  Eun-hyoung Cho ,  Hae-sung Kim

    IPC分类号： G11B7/00 ,  G11B7/12 ,  G11B7/135 ,  G11B7/22

    CPC分类号： G11B7/1378 ,  G11B7/124 ,  G11B7/1353

    摘要： An optical pickup and an optical recording and/or reproducing apparatus using the optical pickup are provided. The optical pickup includes: a light source; an optical bench on which the light source is mounted; a focusing member including an objective lens, focusing light emitted from the light source to form a light spot on an optical information storage medium; and an optical path forming member having a transparent block that includes a light entrance/exit surface on which the optical bench and the focusing member are arranged, a first reflection surface, and a second reflection surface opposing the first reflection surface, where the optical path forming member directs the light emitted from the light source toward the objective lens by reflecting the light emitted from the light source on the first and second reflection surfaces. The optical pickup satisfies the requirement for smaller, slimmer design and can be integrated using semiconductor manufacturing processes.

    摘要翻译： 提供了使用光学拾取器的光学拾取器和光学记录和/或再现装置。 光学拾取器包括：光源; 安装光源的光台; 聚焦构件，包括物镜，聚焦从光源发射的光以在光学信息存储介质上形成光斑; 以及具有透明块的光路形成构件，所述透光块包括配置有所述光学台和所述聚焦构件的光入射/出射面，第一反射面和与所述第一反射面相对的第二反射面， 成形构件通过将从光源发射的光反射在第一和第二反射面上而将从光源发射的光朝向物镜引导。 光学拾取器满足更小，更薄的设计的要求，并且可以使用半导体制造工艺进行集成。

    Method of exposing using electron beam
    9.
    发明申请
    Method of exposing using electron beam 有权
    使用电子束曝光的方法

    公开(公告)号：US20050184258A1

    公开(公告)日：2005-08-25

    申请号：US11066187

    申请日：2005-02-25

    申请人： Hae-sung Kim ,  Myung-bok Lee ,  Jin-seung Sohn ,  Mee-suk Jung ,  Eun-hyoung Cho

    发明人： Hae-sung Kim ,  Myung-bok Lee ,  Jin-seung Sohn ,  Mee-suk Jung ,  Eun-hyoung Cho

    IPC分类号： H01L21/027 ,  H01J37/08

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  Y10S430/143

    摘要： Provided is a method of exposing using an electron beam. The provided method of exposing using the electron beam includes defining main fields on an exposure area of an electron beam exposure target and defining a plurality of sub-fields on the main fields, selecting a main field to be exposed, selecting at least one sub-field of the selected main field, exposing the selected sub-field by using the electron beam, and selecting at least one of the other sub-field, which is not adjacent to the previously selected sub-field and not exposed yet, and exposing the sub-field by using the electron beam.

    摘要翻译： 提供了使用电子束曝光的方法。 所提供的使用电子束曝光的方法包括限定在电子束曝光目标的曝光区域上的主场，并且在主场上定义多个子场，选择要曝光的主场，选择至少一个子场， 选择的主场的场，通过使用电子束曝光所选择的子场，并且选择与先前选择的子场不相邻并且尚未曝光的另一个子场中的至少一个，并且将 子场通过使用电子束。