公开(公告)号：US11594647B2

公开(公告)日：2023-02-28

申请号：US17236204

申请日：2021-04-21

申请人： NATIONAL APPLIED RESEARCH LABORATORIES

发明人： Yuan-Ta Hsieh ,  Chia-Hsin Lee ,  Hann-Huei Tsai ,  Ying-Zong Juang ,  Jian Li ,  Bo-You Liu

IPC分类号： H01L31/0216 ,  H01L31/103

摘要： This invention provides a light-concentrating structure with photosensitivity enhancing effect, including the substrate, buried layer, first electrode layer, second electrode layer, dielectric layer and interconnection structure. The substrate is equipped with a housing space; the buried layer is arranged above the substrate with the housing space; the first electrode layer is arranged above the buried layer; the second electrode layer is arranged in the middle of the first electrode layer; the dielectric layer is arranged above the second electrode layer; the interconnection structure is arranged above the substrate and the first electrode layer surrounding the dielectric layer, which forms an opening and a light-concentrating recess groove.