公开(公告)号：US20240276626A1

公开(公告)日：2024-08-15

申请号：US18568770

申请日：2022-03-24

申请人： NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

发明人： Yuuichi KURASHIMA ,  Taisei MOTOMURA ,  Shinya YANAGIMACHI ,  Hideki TAKAGI ,  Eiji HIGURASHI ,  Takashi MATSUMAE

IPC分类号： H05H1/10 ,  G04F5/14 ,  H03L7/26

CPC分类号： H05H1/10 ,  G04F5/14 ,  H03L7/26

摘要： A small plasma source that enables highly efficient discharge in an ultra-high vacuum state includes a first magnet, a second magnet arranged so that a second magnetic pole faces the first magnetic pole of the first magnet, a third magnet having the second magnetic pole directed in the same direction as the first magnetic pole of the first magnet and arranged to surround the first magnet, a fourth magnet having the first magnetic pole different from the second magnetic pole facing the second magnetic pole of the third magnet and arranged to surround the second magnet, a first electrode provided on sides of the first magnetic pole of the first magnet and the second magnetic pole of the third magnet, a second electrode facing the first electrode and provided on sides of the second magnetic pole of the second magnet and the first magnetic pole of the fourth magnet, and a third electrode arranged between the first electrode and the second electrode. A value obtained by dividing a shorter distance between a distance between the first magnet and the second magnet and a distance between the third magnet and the fourth magnet by an average value of thicknesses of the first to fourth magnets is 1 or more and 10 or less.