公开(公告)号：US08951922B2

公开(公告)日：2015-02-10

申请号：US13801517

申请日：2013-03-13

Applicant: National Taiwan University

Inventor： Ching-Fuh Lin ,  Kuei-Yu Cian ,  Shao-Hsuan Kao

IPC: H01L21/312 ,  C08F2/48 ,  H01L51/00 ,  H01L51/42

CPC classification number: H01L51/0003 ,  B82Y10/00 ,  H01L51/0035 ,  H01L51/0047 ,  H01L51/424 ,  Y02E10/549

Abstract: The present invention relates to a method for fabricating an interlayer, and particularly relates to a method for fabricating an interlayer PCBM which is difficult to be dissolved in organic solvents. The solubility of the interlayer (PCBM) in organic solvents is decreased by polymerization of the interlayer (PCBM). Therefore, the thickness of the interlayer (PCBM) can be efficiently controlled, and the yield rate and efficiency of photoelectric devices can be improved.

Abstract translation: 本发明涉及一种中间层的制造方法，特别涉及难以溶解在有机溶剂中的中间层PCBM的制造方法。 通过中间层（PCBM）的聚合，中间层（PCBM）在有机溶剂中的溶解度降低。 因此，能够有效地控制中间层（PCBM）的厚度，能够提高光电器件的成品率和效率。

公开(公告)号：US20140206131A1

公开(公告)日：2014-07-24

申请号：US13801517

申请日：2013-03-13

Applicant: NATIONAL TAIWAN UNIVERSITY

Inventor： CHING-FUH LIN ,  Kuei-Yu Cian ,  Shao-Hsuan Kao

IPC: H01L51/44

CPC classification number: H01L51/0003 ,  B82Y10/00 ,  H01L51/0035 ,  H01L51/0047 ,  H01L51/424 ,  Y02E10/549

Abstract: The present invention relates to a method for fabricating an interlayer, and particularly relates to a method for fabricating an interlayer PCBM which is difficult to be dissolved in organic solvents. The solubility of the interlayer (PCBM) in organic solvents is decreased by polymerization of the interlayer (PCBM). Therefore, the thickness of the interlayer (PCBM) can be efficiently controlled, and the yield rate and efficiency of photoelectric devices can be improved.

Abstract translation: 本发明涉及一种中间层的制造方法，特别涉及难以溶解在有机溶剂中的中间层PCBM的制造方法。 通过中间层（PCBM）的聚合，中间层（PCBM）在有机溶剂中的溶解度降低。 因此，能够有效地控制中间层（PCBM）的厚度，能够提高光电器件的成品率和效率。