Method of forming silicon
    6.
    发明授权

    公开(公告)号:US10090513B2

    公开(公告)日:2018-10-02

    申请号:US14403478

    申请日:2013-06-03

    申请人: Nexeon Limited

    摘要: A method of forming a particulate material comprising silicon, the method comprising the step of reducing a particulate starting material comprising silica-containing particles having an aspect ratio of at least 3:1 and a smallest dimension of less than 15 microns, or reducing a particulate starting material comprising silica-containing particles comprising a plurality of elongate structural elements, each elongate structural element having an aspect ratio of at least 3:1 and a smallest dimension of less than 15 microns.

    METHOD OF FORMING SILICON
    8.
    发明申请
    METHOD OF FORMING SILICON 审中-公开
    形成硅的方法

    公开(公告)号:US20150104705A1

    公开(公告)日:2015-04-16

    申请号:US14403478

    申请日:2013-06-03

    申请人: Nexeon Limited

    IPC分类号: H01M4/134 H01M4/38

    摘要: A method of forming a particulate material comprising silicon, the method comprising the step of reducing a particulate starting material comprising silica-containing particles having an aspect ratio of at least 3:1 and a smallest dimension of less than 15 microns, or reducing a particulate starting material comprising silica-containing particles comprising a plurality of elongate structural elements, each elongate structural element having an aspect ratio of at least 3:1 and a smallest dimension of less than 15 microns.

    摘要翻译: 一种形成包含硅的颗粒材料的方法,所述方法包括以下步骤:还原颗粒原料,其包含纵横比为至少3:1且最小尺寸小于15微米的含二氧化硅的颗粒,或还原颗粒 包含含有多个细长结构元件的含二氧化硅颗粒的起始材料,每个细长结构元件具有至少3:1的纵横比和小于15微米的最小尺寸。