CERAMIC HEATER
    1.
    发明申请

    公开(公告)号:US20210242053A1

    公开(公告)日:2021-08-05

    申请号:US17111714

    申请日:2020-12-04

    Abstract: A ceramic heater includes a ceramic plate having a front surface that serves as a wafer placement surface, resistance heating elements that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, and a thermocouple passage that extends from a start point in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, to a terminal end position in an outer peripheral portion of the ceramic plate. The thermocouple passage includes a curved portion between the start point and the terminal end position.

    CERAMIC HEATER
    2.
    发明申请
    CERAMIC HEATER 审中-公开

    公开(公告)号:US20200350187A1

    公开(公告)日:2020-11-05

    申请号:US16929743

    申请日:2020-07-15

    Abstract: A ceramic heater includes a ceramic plate in which inner circumferential side and outer circumferential side resistance heating elements are built in; and a cylindrical shaft joined to a rear surface of the ceramic plate. The long hole extends from a start point of the ceramic plate to a terminal position of the outer circumferential portion of the ceramic plate. The entrance portion of the long hole is a long groove. The long groove is provided to extend from the start point to an extended area. Terminals are provided at positions other than the long groove and in a shaft inside area.

    THERMOCOUPLE GUIDE AND CERAMIC HEATER

    公开(公告)号:US20210391193A1

    公开(公告)日:2021-12-16

    申请号:US17303546

    申请日:2021-06-02

    Abstract: A thermocouple guide includes a first tube portion of a straight shape, and a second tube portion connected to the first tube portion and including a curved section that is formed to turn an extension direction from the first tube portion. An outer diameter of at least a tip-side part of the curved section, the tip-side part extending from a tip end of the curved section through a predetermined length, is smaller than an outer diameter of the first tube portion.

    WAFER SUPPORT TABLE
    4.
    发明申请

    公开(公告)号:US20220254662A1

    公开(公告)日:2022-08-11

    申请号:US17577599

    申请日:2022-01-18

    Abstract: A wafer support table includes a ceramic base having a wafer placement surface, and a plurality of heaters embedded in the ceramic base. The ceramic base has a first heater formation surface, a second heater formation surface, and a third heater formation surface in a stated order from the wafer placement surface toward a surface opposite from the wafer placement surface. A first heater is provided on the first heater formation surface so as to be located at a center of the ceramic base. A second heater is provided on the second heater formation surface so as to be located around a periphery of the first heater. A third heater is provided on the third heater formation surface so as to overlap the second heater and is provided in each of a plurality of zones divided from the third heater formation surface by a radial line segment.

    THERMOCOUPLE GUIDE AND CERAMIC HEATER

    公开(公告)号:US20210391194A1

    公开(公告)日:2021-12-16

    申请号:US17303548

    申请日:2021-06-02

    Abstract: A thermocouple guide includes a straight tube portion and a curved tube portion formed in continuation with the straight tube portion to turn an extension direction from the straight tube portion. A cross-section of a tip-side part of the curved tube portion, the tip-side part occupying a predetermined range including a tip end of the curved tube portion, has an external shape that is obtained by linearly cutting both sides of a circle.

    CERAMIC HEATER AND METHOD OF PRODUCING THE SAME

    公开(公告)号:US20210329743A1

    公开(公告)日:2021-10-21

    申请号:US17156974

    申请日:2021-01-25

    Abstract: A ceramic heater includes a ceramic substrate, a resistance heater, a cylindrical shaft, a thermocouple path, and a thermocouple insertion hole. The disc-shaped ceramic substrate has a wafer placement surface at an upper surface. The resistance heater is embedded in the ceramic substrate. The cylindrical shaft supports the ceramic substrate from a lower surface of the ceramic substrate. The thermocouple path is provided between the resistance heater and the wafer placement surface and extends from a start position on a center side to an end position on an outer circumferential side inside the ceramic substrate. The thermocouple insertion hole is open at an inner shaft region of the lower surface of the ceramic substrate surrounded by the cylindrical shaft and communicates with the thermocouple path.

    CERAMIC HEATER
    7.
    发明申请

    公开(公告)号:US20210239541A1

    公开(公告)日:2021-08-05

    申请号:US17115970

    申请日:2020-12-09

    Abstract: A ceramic heater includes a ceramic plate having a surface that serves as a wafer placement surface, resistance heating elements that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, and a thermocouple passage that extends from a start point in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, to a terminal end position in an outer peripheral portion of the ceramic plate. The thermocouple passage includes a stepped portion formed at an intermediate position between the start point and the terminal end position, a long-distance portion extending from the start position to the terminal end position, and a short-distance portion extending from the start position to the intermediate position.

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