WAFER SUPPORT TABLE
    1.
    发明申请
    WAFER SUPPORT TABLE 审中-公开

    公开(公告)号:US20200090964A1

    公开(公告)日:2020-03-19

    申请号:US16693855

    申请日:2019-11-25

    Abstract: A ceramic heater includes a ceramic substrate including, on an upper surface, a wafer mount surface that receives a wafer, and a heater electrode embedded in an inside of the ceramic substrate. The ceramic substrate includes a core portion and a surface layer portion disposed on a surface of the core portion. The surface layer portion has volume resistivity higher than volume resistivity of the core portion. The core portion has thermal conductivity higher than thermal conductivity of the surface layer portion. The surface layer portion is disposed over an area of at least one of a side surface of the core portion and an upper surface of the core portion, the area being not covered with the wafer.

    CERAMIC HEATER
    2.
    发明申请

    公开(公告)号:US20210243846A1

    公开(公告)日:2021-08-05

    申请号:US17132416

    申请日:2020-12-23

    Abstract: A ceramic heater includes a ceramic plate having a surface that serves as a wafer placement surface, resistance heating elements that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, a recess that is formed in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, and terminals that are disposed to be exposed at a side surface of the recess and that supply electric power to the resistance heating element.

    CERAMIC HEATER AND MANUFACTURING METHOD FOR SAME

    公开(公告)号:US20210242047A1

    公开(公告)日:2021-08-05

    申请号:US17159386

    申请日:2021-01-27

    Abstract: A ceramic heater includes a ceramic plate having a surface that serves as a wafer placement surface, resistance heating elements and that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, a recess that is formed in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, and that has a size equal to a size of the within-shaft region, an elongate hole that extends from an opening formed in a side surface of the recess up to a predetermined terminal end position in an outer peripheral portion of the ceramic plate, and associated parts (such as terminals) that are disposed in the within-shaft region of the rear surface of the ceramic plate.

    CERAMIC HEATER
    4.
    发明申请

    公开(公告)号:US20210242053A1

    公开(公告)日:2021-08-05

    申请号:US17111714

    申请日:2020-12-04

    Abstract: A ceramic heater includes a ceramic plate having a front surface that serves as a wafer placement surface, resistance heating elements that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, and a thermocouple passage that extends from a start point in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, to a terminal end position in an outer peripheral portion of the ceramic plate. The thermocouple passage includes a curved portion between the start point and the terminal end position.

    WAFER PLACEMENT TABLE AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:US20210007181A1

    公开(公告)日:2021-01-07

    申请号:US16898772

    申请日:2020-06-11

    Abstract: A wafer placement table includes: a ceramic member having a wafer placement surface; a mesh electrode buried in the ceramic member; a conductive connection member in contact with the mesh electrode and exposed to outside from a surface of the ceramic member on the opposite side of the wafer placement surface; and an external current-carrying member joined to a surface of the connection member exposed to outside. The mesh electrode has a mesh opening in a region that faces the connection member, and the mesh opening is filled with a sintered conductor being a sintered body of a mixture containing a conductive powder and a ceramic raw material.

    CERAMIC HEATER AND THERMOCOUPLE GUIDE

    公开(公告)号:US20210243847A1

    公开(公告)日:2021-08-05

    申请号:US17159363

    申请日:2021-01-27

    Abstract: A ceramic heater includes a ceramic plate having a wafer placement surface, a tubular shaft having one end that is bonded to a rear surface of the ceramic plate on an opposite side to the wafer placement surface, a within-shaft region of the rear surface of the ceramic plate, an elongate hole extending from a start point in an outer peripheral portion of the within-shaft region to a terminal end position in the outer peripheral portion of the ceramic plate, and a thermocouple guide that guides a tip end of an outer-peripheral-side thermocouple to come into the start point of the elongate hole. A portion of the thermocouple guide, the portion extending from the other end (lower end) of the tubular shaft to the start point of the elongate hole, is formed in a shape following an inner wall of the tubular shaft.

    CERAMIC HEATER
    7.
    发明申请

    公开(公告)号:US20210235548A1

    公开(公告)日:2021-07-29

    申请号:US17301773

    申请日:2021-04-14

    Abstract: A ceramic heater includes a ceramic plate, a main resistance heating element, and a sub resistance heating element. The main resistance heating element is a coil that is disposed in the ceramic plate, that is wired from one of a pair of main terminals in a one-stroke pattern, and that reaches the other of the pair of the main terminals. The sub resistance heating element is a heating element that is disposed in the ceramic plate, that complements heating with the main resistance heating element, and that has a two-dimensional shape.

    CERAMIC HEATER AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210378061A1

    公开(公告)日:2021-12-02

    申请号:US17444753

    申请日:2021-08-10

    Abstract: A ceramic heater includes: a ceramic plate which is provided with a wafer placement surface on an upper surface and in which a heating resistor is internally embedded; a ceramic tubular shaft with an upper end bonded to a lower surface of the plate; and power feeding members which penetrate a peripheral wall part of the tubular shaft in a vertical direction, and are electrically connected to the heating resistor. The power feeding members are embedded in the peripheral wall part of the tubular shaft, and are in tight contact with a ceramic material of the tubular shaft.

    CERAMIC HEATER
    9.
    发明申请

    公开(公告)号:US20210243850A1

    公开(公告)日:2021-08-05

    申请号:US17301992

    申请日:2021-04-21

    Abstract: A ceramic heater includes a ceramic plate, a main resistance heating element, and sub resistance heating elements. The main resistance heating element is a heating element that is disposed on a first plane parallel with a wafer placement surface in the ceramic plate and that has a coil shape. The sub resistance heating elements are heating elements that are disposed on a second plane parallel with the first plane in the ceramic plate between the first plane and the wafer placement surface, that complement heating with the main resistance heating element, and that have a two-dimensional shape.

    CERAMIC HEATER AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210227639A1

    公开(公告)日:2021-07-22

    申请号:US17301627

    申请日:2021-04-09

    Abstract: A ceramic heater includes a ceramic plate. The ceramic plate has a wafer placement surface, and is divided into an inner-peripheral zone having a circular shape and an outer-peripheral zone having an annular shape. An inner-peripheral resistance heating element that is composed of high-melting-point metal is disposed in the inner-peripheral zone. An outer-peripheral resistance heating element that has at least a surface composed of metal carbide is disposed in the outer-peripheral zone.

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