公开(公告)号：US20190228953A1

公开(公告)日：2019-07-25

申请号：US16367643

申请日：2019-03-28

Applicant: NHK SPRING CO., LTD.

Inventor： Toshihiro TACHIKAWA ,  Naoya AIKAWA ,  Go TAKAHARA ,  Kohei SUZUKI ,  Hiroshi MITSUDA

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683 ,  H01J37/34 ,  C23C16/46 ,  C23C16/458 ,  C23C14/50

Abstract: Provided is a stage for precisely controlling a substrate temperature and a manufacturing method thereof. Alternatively, a film-forming apparatus or a film-processing apparatus having the stage is provided. The stage includes a base material and a heater layer over the base material. The heater layer has a first insulating film, a heater wire over the first insulating film, and a second insulating film over the heater wire. The heater wire includes more than one kind of metal selected from tungsten, nickel. chromium cobalt, and molybdenum.