POLISHING DEVICE, POLISHING METHOD, AND MACHINE PART

    公开(公告)号:US20250010425A1

    公开(公告)日:2025-01-09

    申请号:US18897639

    申请日:2024-09-26

    Abstract: A polishing device according to an embodiment comprises: a supporting unit for supporting a polishing tool, a stage for holding an object to be polished; a first drive unit for causing the support unit and the stage to move relative to one another along a shape of a polishing surface of the object to be polished, and a second drive unit for causing the support unit to control synchronously with the first drive unit such that one predetermined end of a polishing member attached to the polishing tool faces in a movement direction of the polishing member.

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