POLISHING DEVICE, POLISHING METHOD, AND MACHINE PART

    公开(公告)号:US20250010425A1

    公开(公告)日:2025-01-09

    申请号:US18897639

    申请日:2024-09-26

    Abstract: A polishing device according to an embodiment comprises: a supporting unit for supporting a polishing tool, a stage for holding an object to be polished; a first drive unit for causing the support unit and the stage to move relative to one another along a shape of a polishing surface of the object to be polished, and a second drive unit for causing the support unit to control synchronously with the first drive unit such that one predetermined end of a polishing member attached to the polishing tool faces in a movement direction of the polishing member.

    PUNCH FOR RIVETING, DEVICE IN WHICH PUNCH FOR RIVETING IS DISPOSED, AND METHOD FOR JOINING MEMBERS

    公开(公告)号:US20250001481A1

    公开(公告)日:2025-01-02

    申请号:US18885162

    申请日:2024-09-13

    Abstract: A novel punch for riveting with reduced load on a shaft of a rivet is provided. Alternatively, a device that is disposed with a novel punch for riveting with reduced load on a shaft of a rivet is provided. Alternatively, a method for joining members using a novel punch for riveting with reduced load on a shaft of a rivet is provided. A punch for riveting according to an embodiment of present invention includes joining a first member having a convex part and a second member having a through hole fitting with the convex part by plastically deforming the convex part, wherein a contact surface with the convex part is inclined in a range of 80° to 89° with respect to a center axis.

    STAGE AND METHOD OF MANUFACTURING STAGE

    公开(公告)号:US20210398839A1

    公开(公告)日:2021-12-23

    申请号:US17463786

    申请日:2021-09-01

    Abstract: A stage includes a base material having a first surface and a second surface adjacent to the first surface, and an insulating film including a plurality of particles, each of the plurality of particles having a flat surface. The flat surface included in the insulating film is provided along the first surface and the second surface. The base material includes a third surface in a direction 180 degrees opposite to the first surface, and a part of the flat surface included in the insulating film is provided along the third surface, and a surface obtained by extending the first surface and a surface obtained by extending the second surface intersect at 90 degrees. The base material includes a third surface in a direction 180 degrees opposite to the first surface, and a part of the flat surface included in the insulating film is provided along the third surface.

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