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公开(公告)号:US12218271B2
公开(公告)日:2025-02-04
申请号:US18507177
申请日:2023-11-13
Applicant: NICHIA CORPORATION
Inventor: Shun Kitahama , Yoshiki Inoue , Kazuhiro Nagamine , Junya Narita
Abstract: A light emitting element includes: a semiconductor structure including: a substrate, an n-side nitride semiconductor layer located on the substrate, and a p-side nitride semiconductor layer located on the n-side nitride semiconductor layer, wherein a p-side nitride semiconductor side of the semiconductor structure is a light extraction face side, and an n-side nitride semiconductor side of the semiconductor structure is a mounting face side; a first protective layer located on and in direct contact with an upper face of the p-side nitride semiconductor layer in a region corresponding to the peripheral portion of the p-side nitride semiconductor layer; and a current diffusion layer located on and in direct contact with an upper face of the p-side nitride semiconductor layer in a region corresponding to the area inside of the peripheral portion. The current diffusion layer does not overlap the first protective layer in a top view.
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公开(公告)号:US11855238B2
公开(公告)日:2023-12-26
申请号:US17338446
申请日:2021-06-03
Applicant: NICHIA CORPORATION
Inventor: Shun Kitahama , Yoshiki Inoue , Kazuhiro Nagamine , Junya Narita
CPC classification number: H01L33/0095 , H01L33/007 , H01L33/0075 , H01L33/145 , H01L33/32 , H01L33/382 , H01L33/44 , H01L21/268 , H01L33/22 , H01L2933/0025
Abstract: A light emitting element includes: a semiconductor structure including: a substrate, an n-side nitride semiconductor layer located on the substrate, and a p-side nitride semiconductor layer located on the n-side nitride semiconductor layer, wherein a p-side nitride semiconductor side of the semiconductor structure is a light extraction face side, and an n-side nitride semiconductor side of the semiconductor structure is a mounting face side; a first protective layer located on and in direct contact with an upper face of the p-side nitride semiconductor layer in a region corresponding to the peripheral portion of the p-side nitride semiconductor layer; and a current diffusion layer located on and in direct contact with an upper face of the p-side nitride semiconductor layer in a region corresponding to the area inside of the peripheral portion. The current diffusion layer does not overlap the first protective layer in a top view.
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公开(公告)号:US11056612B2
公开(公告)日:2021-07-06
申请号:US16677287
申请日:2019-11-07
Applicant: NICHIA CORPORATION
Inventor: Shun Kitahama , Yoshiki Inoue , Kazuhiro Nagamine , Junya Narita
Abstract: A light emitting element includes: a semiconductor structure including: a substrate, an n-side nitride semiconductor layer containing an n-type impurity and located on the substrate, and a p-side nitride semiconductor layer containing a p-type impurity and located on the n-side nitride semiconductor layer, wherein a resistance of a peripheral portion of the p-side nitride semiconductor layer is higher than a resistance of an area inside of the peripheral portion in a top view, wherein a p-side nitride semiconductor side of the semiconductor structure is a light extraction face side, and an n-side nitride semiconductor side of the semiconductor structure is a mounting face side; and first protective layer located on an upper face of the p-side nitride semiconductor layer in a region corresponding to the peripheral portion of the p-side nitride semiconductor layer.
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