METHOD OF MANUFACTURING PATTERNED BASE MEMBER, PROCESSING METHOD, AND METHOD OF MANUFACTURING LASER ELEMENT

    公开(公告)号:US20240012331A1

    公开(公告)日:2024-01-11

    申请号:US18348313

    申请日:2023-07-06

    Inventor: Tsutomu YAMADA

    CPC classification number: G03F7/40 G03F7/2037 H01S5/12

    Abstract: A method of manufacturing a patterned base member includes forming a resist layer including a positive resist on a base member, exposing a portion of the resist layer to an electron beam to form an exposed portion and an unexposed portion in the resist layer, developing the resist layer to remove the exposed portion and leave the unexposed portion to provide a patterned resist layer, irradiating an entirety of the patterned resist layer with an electron beam, and etching the base member using the patterned resist layer as an etching mask or using a patterned mask layer, to which a pattern of the patterned resist layer is transferred, as an etching mask.

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