SPATIAL LIGHT MODULATOR, PHOTOLITHOGRAPHING APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
    2.
    发明申请
    SPATIAL LIGHT MODULATOR, PHOTOLITHOGRAPHING APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE 有权
    空调光调制器,光刻设备,曝光装置及其制造方法

    公开(公告)号:US20160266378A1

    公开(公告)日:2016-09-15

    申请号:US15164225

    申请日:2016-05-25

    申请人: NIKON CORPORATION

    IPC分类号: G02B26/08 G03F7/20

    摘要: A spatial light modulator comprises, a first light modulation element having a substrate, a reflecting mirror, a movable portion displaced relative to the substrate while supporting the reflecting mirror, and a top electrode adsorbing the movable portion by electrostatic force between the movable portion and the top electrode in a position farther away from the substrate than the movable portion, a second light modulation element placed adjacent to the first light modulation element in the substrate, having a reflecting mirror, a movable portion displaced relative to the substrate while supporting the reflecting mirror, and a top electrode adsorbing the movable portion by electrostatic force between the movable portion and the top electrode in a position farther away from the substrate than the movable portion, and electrode supporting portions commonly supporting the top electrodes of the first light modulation element and the second light modulation element relative to the substrate.

    摘要翻译: 空间光调制器包括:具有基板的第一光调制元件,反射镜,支撑反射镜时相对于基板移动的可动部分;以及通过静电力在可移动部分和 顶部电极位于比可移动部分更远离衬底的位置;第二光调制元件,邻近第一光调制元件放置在衬底中,具有反射镜,可移动部分相对于衬底移动,同时支撑反射镜 以及顶部电极,通过静电力在可动部分和顶部电极之间远离基板的位置比可动部分吸附可移动部分;以及电极支撑部分,其通常支撑第一光调制元件的顶部电极和 第二光调制元件。