公开(公告)号：US09953808B2

公开(公告)日：2018-04-24

申请号：US14787272

申请日：2013-04-30

申请人： NIPPON ITF, INC.

发明人： Naoto Okazaki ,  Ken Yoshihara ,  Hiroshi Ishizuka ,  Tomoyasu Matsuno ,  Shinji Narahara

IPC分类号： H01J37/34 ,  H01J37/32 ,  C23C14/32

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/32614 ,  H01J37/3266 ,  H01J37/32669 ,  H01J2237/327 ,  H01J2237/332

摘要： Provided is an arc evaporation source for melting and evaporating a cathode material by arc discharge for film formation on a surface of a substrate, and including a cathode formed in a substantially disc shape and a magnetic field generating apparatus, disposed at a back side of the cathode. The magnetic field generating apparatus generates a magnetic field which forms magnetic lines that form an acute angle with respect to a substrate direction at an outer circumferential surface of the cathode, magnetic lines that are substantially perpendicular to the discharge surface at an outermost circumference part of the discharge surface of the cathode, and magnetic lines that form an acute angle with respect to a center direction of the cathode at a region towards the outer circumferential surface of the discharge surface of the cathode, by at least one permanent magnet disposed at the back side of the cathode.