公开(公告)号：US20210025839A1

公开(公告)日：2021-01-28

申请号：US16949041

申请日：2020-10-09

Applicant: NOVA MEASURING INSTRUMENTS, INC.

Inventor： Charles Thomas Larson ,  Kavita Shah ,  Wei Ti Lee

IPC: G01N23/2273 ,  H01L21/67 ,  C23C16/52 ,  C23C16/24 ,  C23C16/455 ,  C23C16/06

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.

公开(公告)号：US20190277783A1

公开(公告)日：2019-09-12

申请号：US16351153

申请日：2019-03-12

Applicant: NOVA MEASURING INSTRUMENTS, INC.

Inventor： Charles Thomas Larson ,  Kavita Shah ,  Wei Ti Lee

IPC: G01N23/2273 ,  H01L21/67 ,  C23C16/06 ,  C23C16/24 ,  C23C16/455 ,  C23C16/52

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.

公开(公告)号：US12158437B2

公开(公告)日：2024-12-03

申请号：US18337397

申请日：2023-06-19

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： Charles Larson ,  Kavita Shah ,  Wei T Lee

IPC: G01N23/2273 ,  C23C16/06 ,  C23C16/24 ,  C23C16/455 ,  C23C16/52 ,  H01L21/67

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.

公开(公告)号：US11680915B2

公开(公告)日：2023-06-20

申请号：US17804599

申请日：2022-05-30

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： Charles Larson ,  Kavita Shah ,  Wei T Lee

IPC: G01N23/2273 ,  H01L21/67 ,  C23C16/52 ,  C23C16/24 ,  C23C16/455 ,  C23C16/06

CPC classification number: G01N23/2273 ,  C23C16/06 ,  C23C16/24 ,  C23C16/45529 ,  C23C16/52 ,  H01L21/67253

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.

公开(公告)号：US11346795B2

公开(公告)日：2022-05-31

申请号：US16949041

申请日：2020-10-09

Applicant: NOVA MEASURING INSTRUMENTS, INC.

Inventor： Charles Thomas Larson ,  Kavita Shah ,  Wei Ti Lee

IPC: G01N23/2273 ,  H01L21/67 ,  C23C16/52 ,  C23C16/24 ,  C23C16/455 ,  C23C16/06

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.

公开(公告)号：US10801978B2

公开(公告)日：2020-10-13

申请号：US16351153

申请日：2019-03-12

Applicant: NOVA MEASURING INSTRUMENTS, INC.

Inventor： Charles Thomas Larson ,  Kavita Shah ,  Wei Ti Lee

IPC: G01N23/2273 ,  H01L21/67 ,  C23C16/52 ,  C23C16/24 ,  C23C16/455 ,  C23C16/06

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.