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公开(公告)号：US20200057005A1
公开(公告)日：2020-02-20
申请号：US16558212
申请日：2019-09-02
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , ODED COHEN , IGOR TUROVETS
IPC: G01N21/956 , G01N21/95 , G01N21/88 , H01L21/66
Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure comprising a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.
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公开(公告)号：US20210150387A1
公开(公告)日：2021-05-20
申请号：US16973092
申请日：2019-06-14
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： EITAN ROTHSTEIN , ILYA RUBINOVICH , NOAM TAL , BARAK BRINGOLTZ , YONGHA KIM , ARIEL BROITMAN , ODED COHEN , EYLON RABINOVICH , TAL ZAHARONI , SHAY YOGEV , DANIEL KANDEL
Abstract: A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.
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