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公开(公告)号：US20200025693A1
公开(公告)日：2020-01-23
申请号：US16524296
申请日：2019-07-29
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , DROR SHAFIR , YANIR HAINICK , SHAHAR GOV
IPC: G01N21/956 , G03F7/20 , G01N21/95
Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.
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公开(公告)号：US20200057005A1
公开(公告)日：2020-02-20
申请号：US16558212
申请日：2019-09-02
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , ODED COHEN , IGOR TUROVETS
IPC: G01N21/956 , G01N21/95 , G01N21/88 , H01L21/66
Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure comprising a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.
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公开(公告)号：US20190154594A1
公开(公告)日：2019-05-23
申请号：US16231718
申请日：2018-12-24
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , DANNY GROSSMAN , DROR SHAFIR , YOAV BERLATZKY , YANIR HAINICK
IPC: G01N21/956 , G01B9/02 , G01B11/06 , G01N21/88
Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
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Patent Agency Ranking
公开(公告)号：US20180372645A1
公开(公告)日：2018-12-27
申请号：US16062127
申请日：2016-12-15
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , YANIR HAINICK , YONATAN OREN
Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.
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公开(公告)号：US20180372644A1
公开(公告)日：2018-12-27
申请号：US16062114
申请日：2016-12-15
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , YANIR HAINICK , YONATAN OREN , VLADIMIR MACHAVARIANI
CPC classification number: G01N21/65 , G01B11/0666 , G01B2210/56 , G01L1/24 , G01N21/658 , G01N21/9501 , G03F7/70625 , H01L22/12
Abstract: A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the characteristic(s) to be measured; processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme; analyzing the distribution of Raman-contribution efficiency and determining the characteristic(s) of the structure.
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公开(公告)号：US20210247699A1
公开(公告)日：2021-08-12
申请号：US17254357
申请日：2019-07-18
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , MICHAEL CHEMAMA , SMADAR FERBER , YAIR HAINICK , BORIS LEVANT , ZE'EV LINDENFELD , DROR SHAFIR , YURI SHIRMAN , ELAD SCHLEIFER
Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.
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公开(公告)号：US20210003508A1
公开(公告)日：2021-01-07
申请号：US16945975
申请日：2020-08-03
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , YANIR HAINICK , YONATAN OREN
Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.
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公开(公告)号：US20200256799A1
公开(公告)日：2020-08-13
申请号：US16792937
申请日：2020-02-18
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , YANIR HAINICK , YONATAN OREN , VLADIMIR MACHAVARIANI
Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.
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