公开(公告)号：US20200006165A1

公开(公告)日：2020-01-02

申请号：US16488967

申请日：2018-02-27

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： IGOR TUROVETS

IPC: H01L21/66 ,  G01R31/28 ,  G01N21/47 ,  G01B11/06 ,  G01B11/26 ,  G11C29/38

Abstract: A test site and method are herein disclosed for predicting E-test structure (in-die structure) and/or device performance. The test site comprises an E-test structure and OCD-compatible multiple structures in the vicinity of the E-test structure to allow optical scatterometry (OCD) measurements. The OCD-compatible multiple structures are modified by at least one modification technique selected from (a) multiplication type modification technique, (b) dummification type modification technique, (c) special Target design type modification technique, and (d) at least one combination of (a), (b) and (c) for having a performance equivalent to the performance of the E-test structure.

公开(公告)号：US20200057005A1

公开(公告)日：2020-02-20

申请号：US16558212

申请日：2019-09-02

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： GILAD BARAK ,  ODED COHEN ,  IGOR TUROVETS

IPC: G01N21/956 ,  G01N21/95 ,  G01N21/88 ,  H01L21/66

Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure comprising a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.

公开(公告)号：US20190339056A1

公开(公告)日：2019-11-07

申请号：US16416296

申请日：2019-05-20

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： BOAZ BRILL ,  BORIS SHERMAN ,  IGOR TUROVETS

IPC: G01B11/02 ,  G03F7/20

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.