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公开(公告)号:US20200075585A1
公开(公告)日:2020-03-05
申请号:US16120098
申请日:2018-08-31
Applicant: NXP B.V.
Inventor: Petrus Hubertus Cornelis Magnee , Pieter Simon van Dijk , Johannes Josephus Theodorus Marinus Donkers , Dolphin Abessolo Bidzo
IPC: H01L27/082 , H01L21/8222 , H01L21/8249 , H01L21/02 , H01L21/306 , H01L21/266 , H01L21/225 , H01L21/324 , H01L27/02 , H01L27/06 , H01L29/04 , H01L29/165 , H01L29/66 , H01L29/732 , H01L29/737
Abstract: This specification discloses methods for integrating a SiGe-based HBT (heterojunction bipolar transistor) and a Si-based BJT (bipolar junction transistor) together in a single manufacturing process that does not add a lot of process complexity, and an integrated circuit that can be fabricated utilizing such a streamlined manufacturing process. In some embodiments, such an integrated circuit can enjoy both the benefits of a higher RF (radio frequency) performance for the SiGe HBT and a lower leakage current for the Si-based BJT. In some embodiments, such an integrated circuit can be applied to an ESD (electrostatic discharge) clamp circuit, in order to achieve a lower, or no, yield-loss.
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公开(公告)号:US10784257B2
公开(公告)日:2020-09-22
申请号:US16120098
申请日:2018-08-31
Applicant: NXP B.V.
Inventor: Petrus Hubertus Cornelis Magnee , Pieter Simon van Dijk , Johannes Josephus Theodorus Marinus Donkers , Dolphin Abessolo Bidzo
IPC: H01L27/082 , H01L21/02 , H01L21/225 , H01L21/266 , H01L21/306 , H01L21/324 , H01L21/8222 , H01L21/8249 , H01L27/02 , H01L27/06 , H01L29/04 , H01L29/165 , H01L29/66 , H01L29/732 , H01L29/737
Abstract: This specification discloses methods for integrating a SiGe-based HBT (heterojunction bipolar transistor) and a Si-based BJT (bipolar junction transistor) together in a single manufacturing process that does not add a lot of process complexity, and an integrated circuit that can be fabricated utilizing such a streamlined manufacturing process. In some embodiments, such an integrated circuit can enjoy both the benefits of a higher RF (radio frequency) performance for the SiGe HBT and a lower leakage current for the Si-based BJT. In some embodiments, such an integrated circuit can be applied to an ESD (electrostatic discharge) clamp circuit, in order to achieve a lower, or no, yield-loss.
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