公开(公告)号：US20170045448A1

公开(公告)日：2017-02-16

申请号：US14824187

申请日：2015-08-12

Applicant: National Applied Research Laboratories

Inventor： Chun-Fu Lin ,  Chun-Li Chang ,  Tai-Shan Liao ,  Hung-Ji Huang ,  Chi-Hung Huang

IPC: G01N21/59

CPC classification number: G01N21/59 ,  G01N21/9501 ,  G01N21/9505 ,  G01N21/95692 ,  G01N2021/3155 ,  G01N2201/12

Abstract: An apparatus is provided for detecting transmittance of a trench. The trench is located on an infrared-transmittable material, which can be a wafer. The wafer is obtained after a ditching process. An image of the wafer is fetched. The contrast of the image is greatly enhanced. The contrast-enhanced image is used for automated analysis of the transmittance of the trench. Accuracy of detecting the transmittance is improved. Hence, the present invention uses a simple structure to detect transmittance defects of the trench for ensuring goodness of the wafer.

Abstract translation: 提供一种用于检测沟槽的透射率的装置。 沟槽位于红外透射材料上，其可以是晶片。 在脱水处理之后获得晶片。 取出晶片的图像。 图像的对比度大大提高。 对比度增强图像用于自动分析沟槽的透射率。 提高了透射率的检测精度。 因此，本发明使用简单的结构来检测沟槽的透光率缺陷，以确保晶片的良好性。

公开(公告)号：US10126472B2

公开(公告)日：2018-11-13

申请号：US15256715

申请日：2016-09-05

Applicant: National Applied Research Laboratories

Inventor： Jyh-Rou Sze ,  Po-Jui Chen ,  Chun-Fu Lin

IPC: G01J1/08 ,  G02B5/18 ,  G02B17/00 ,  G02B27/30 ,  G02B27/42 ,  G02B27/10 ,  G01J3/02 ,  G01J3/18

Abstract: A multi-band spectrum division device is provided, comprising: a first parabolic reflection mirror, planar multi-mirrors, an optical grating and a second parabolic mirror. The first parabolic mirror is configured to reduce the divergent angle of incident optical beam, and to generate a collimated optical beam. The planar multi-mirrors are configured to adjust the incident angles of collimated beam on the grating surface. The grating is configured to disperse the incident signals with multi-wavelengths. The second parabolic mirror is configured to focus the multi-wavelength signals on its focal plane. Besides, each of the planar multi-mirrors has different location and angle in this device.

公开(公告)号：US09594021B2

公开(公告)日：2017-03-14

申请号：US14824187

申请日：2015-08-12

Applicant: National Applied Research Laboratories

Inventor： Chun-Fu Lin ,  Chun-Li Chang ,  Tai-Shan Liao ,  Hung-Ji Huang ,  Chi-Hung Huang

IPC: G01N21/00 ,  G01N21/86 ,  G01N21/88 ,  G01N21/59

CPC classification number: G01N21/59 ,  G01N21/9501 ,  G01N21/9505 ,  G01N21/95692 ,  G01N2021/3155 ,  G01N2201/12

Abstract: An apparatus is provided for detecting transmittance of a trench. The trench is located on an infrared-transmittable material, which can be a wafer. The wafer is obtained after a ditching process. An image of the wafer is fetched. The contrast of the image is greatly enhanced. The contrast-enhanced image is used for automated analysis of the transmittance of the trench. Accuracy of detecting the transmittance is improved. Hence, the present invention uses a simple structure to detect transmittance defects of the trench for ensuring goodness of the wafer.

Abstract translation: 提供一种用于检测沟槽的透射率的装置。 沟槽位于红外透射材料上，其可以是晶片。 在脱水处理之后获得晶片。 取出晶片的图像。 图像的对比度大大提高。 对比度增强图像用于自动分析沟槽的透射率。 提高了透射率的检测精度。 因此，本发明使用简单的结构来检测沟槽的透光率缺陷，以确保晶片的良好性。