Apparatus of Detecting Transmittance of Trench on Infrared-Transmittable Material and Method Thereof
    1.
    发明申请
    Apparatus of Detecting Transmittance of Trench on Infrared-Transmittable Material and Method Thereof 有权
    检测红外透射材料上的沟槽透射率的装置及其方法

    公开(公告)号:US20170045448A1

    公开(公告)日:2017-02-16

    申请号:US14824187

    申请日:2015-08-12

    Abstract: An apparatus is provided for detecting transmittance of a trench. The trench is located on an infrared-transmittable material, which can be a wafer. The wafer is obtained after a ditching process. An image of the wafer is fetched. The contrast of the image is greatly enhanced. The contrast-enhanced image is used for automated analysis of the transmittance of the trench. Accuracy of detecting the transmittance is improved. Hence, the present invention uses a simple structure to detect transmittance defects of the trench for ensuring goodness of the wafer.

    Abstract translation: 提供一种用于检测沟槽的透射率的装置。 沟槽位于红外透射材料上,其可以是晶片。 在脱水处理之后获得晶片。 取出晶片的图像。 图像的对比度大大提高。 对比度增强图像用于自动分析沟槽的透射率。 提高了透射率的检测精度。 因此,本发明使用简单的结构来检测沟槽的透光率缺陷,以确保晶片的良好性。

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