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公开(公告)号：US09618734B2
公开(公告)日：2017-04-11
申请号：US14741550
申请日：2015-06-17
Applicant: National Applied Research Laboratories
Inventor： Jiun-Woei Huang , Shih-Feng Tseng , Jer-Liang Andrew Yeh
CPC classification number: G02B17/0832 , G02B13/18 , G02B13/22 , G02B17/08 , G02B27/0025 , G03F7/7015 , G03F7/70225
Abstract: A common optical components exposer lens set having a single non-spherical surface, comprising a common optical element set, comprising a first, second, and third lens arranged sequentially; a spherical reflecting mirror, arranged below the third spherical lens; and a planar reflecting lens, comprising a first and second planar reflecting, inclinedly arranged above the first lens, so that an equi-multiplication exposer lens set is formed by the spherical mirror set, so as to impinge a pattern on an object onto a photosensitive surface. As such, a single non-spherical surface and overlapping assembly, composed of three lenses having the single non-spherical surface and a spherical reflecting lens and two planar reflecting lenses overlapping together, in which two optical material types are arranged with respect to each other.
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Patent Agency Ranking
公开(公告)号：US09891533B2
公开(公告)日：2018-02-13
申请号：US14740445
申请日：2015-06-16
Applicant: National Applied Research Laboratories
Inventor： Jiun-Woei Huang , Shih-Feng Tseng , Jer-Liang Yeh
CPC classification number: G03F7/7015 , G02B13/18 , G02B13/22 , G02B17/08 , G03F7/70225
Abstract: A conjugate common light path lithography lens set includes a first, second, third, and fourth spherical mirrors, arranged sequentially, a spherical reflecting mirror arranged below the fourth spherical mirror, a first and second planar reflecting mirrors, inclinedly arranged above the first spherical mirror, so that a conjugate telecentric component pattern is formed to maintain an pattern of an object to have a non-deformed pattern after experiencing these optical components. As such, the omni-spherical mirror set and two kinds of optical material are mutually arranged to form the novel conjugate common light path lithography lens set. This may further achieve the function of the lithography lens, and have a direct effect on the manufacturing cost. And, the efficacies of reduced component number, easier manufacture of the optical components (satisfied with the lens manufacturing's experience equation), easier calibration, reduced chromatic abberation, optimized aperature F/#, and a reduced cost may be achieved.
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公开(公告)号：US20160370564A1
公开(公告)日：2016-12-22
申请号：US14740445
申请日：2015-06-16
Applicant: National Applied Research Laboratories
Inventor： Jiun-Woei Huang , Shih-Feng Tseng , Jer-Liang Yeh
CPC classification number: G03F7/7015 , G02B13/18 , G02B13/22 , G02B17/08 , G03F7/70225
Abstract: A conjugate common light path lithography lens set includes a first, second, third, and fourth spherical mirrors, arranged sequentially, a spherical reflecting mirror arranged below the fourth spheircal mirror, a first and second planar reflecting mirrors, inclinedly arranged above the first spherical mirror, so that a conjugate telecentric component pattern is formed to maintain an pattern of an object to have a non-deformed pattern after experiencing these optical components. As such, the omni-spherical mirror set and two kinds of optical material are mutually arranged to form the novel conjugate common light path lithography lens set. This may further achieve the function of the lithography lens, and have a direct effect on the manufacturing cost. And, the efficacies of reduced component number, easier manufacture of the optical components (satisfied with the lens manufacturing's experience equation), easier calibration, reduced chromatic abberation, optimized aperature F/#, and a reduced cost may be achieved.
Abstract translation: 共轭共同光路光刻透镜组包括依次布置的第一，第二，第三和第四球面镜，布置在第四半球镜下方的球面反射镜，倾斜地布置在第一球面镜上方的第一和第二平面反射镜 ，使得形成共轭远心分量图案，以在经历这些光学部件之后保持物体的图案具有未变形的图案。 因此，全球镜组和两种光学材料相互排列，形成新型共轭普通光路光刻透镜组。 这可以进一步实现光刻透镜的功能，并且直接影响制造成本。 并且，可以实现减少的部件数量，更容易制造光学部件（满足透镜制造经验方程式），更容易的校准，减少色彩偏差，优化的温度F /＃和降低成本的功效。
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4.发明申请公开(公告)号：US20160370563A1
公开(公告)日：2016-12-22
申请号：US14741550
申请日：2015-06-17
Applicant: National Applied Research Laboratories
Inventor： Jiun-Woei Huang , Shih-Feng Tseng , Jer-Liang Andrew Yeh
CPC classification number: G02B17/0832 , G02B13/18 , G02B13/22 , G02B17/08 , G02B27/0025 , G03F7/7015 , G03F7/70225
Abstract: A common optical components exposer lens set having a single non-spherical surface, comprising a common optical element set, comprising a first, second, and third lens arranged sequentially; a spherical reflecting mirror, arranged below the third spherical lens; and a planar reflecting lens, comprising a first and second planar reflecting, inclinedly arranged above the first lens, so that an equi-multiplication exposer lens set is formed by the spherical mirror set, so as to impinge a pattern on an object onto a photosensitive surface. As such, a single non-spherical surface and overlapping assembly, composed of three lenses having the single non-spherical surface and a spherical reflecting lens and two planar reflecting lenses overlapping together, in which two optical material types are arranged with respect to each other.
Abstract translation: 具有单个非球面的普通光学部件曝光透镜组包括共同的光学元件组，包括依次布置的第一，第二和第三透镜; 布置在第三球面透镜下方的球面反射镜; 以及平面反射透镜，包括倾斜地布置在第一透镜上方的第一和第二平面反射镜，使得通过球面镜组形成等倍曝光透镜组，以便将物体上的图案撞击到感光体上 表面。 这样，由具有单个非球面的三个透镜和球面反射透镜和两个重叠在一起的平面反射透镜组成的单个非球形表面和重叠组件，其中两个光学材料类型相对于彼此布置 。
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公开(公告)号：US10942456B1
公开(公告)日：2021-03-09
申请号：US16745475
申请日：2020-01-17
Applicant: National Applied Research Laboratories
Inventor： Jiun-Woei Huang , Min-Wei Hung , Kuo-Cheng Huang
IPC: G03F7/20
Abstract: An ultraviolet (UV) light source is provided. The device uses a high-uniformity diode array. A lens unit of collimated illumination lenses is used. A light source of UV light-emitting diode (UVLED) array is formed and passes through the lens unit to uniformly distribute the light source and obtain a collimated light. The present invention comprises a light source of UVLED array; a collimated illumination lens unit; and a substrate. The construction is simple. The present invention can be applied in the lithography of a semiconductor. The lithography forms contact lines of widths not greater than 3 microns (μm); soft-contact lines of widths of 3˜30 μm; and short-spaced lines of widths of 30˜200 μm. The present invention avoids the mask from contact wear-out for multiple uses, and further reduces the replacement rate.
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公开(公告)号：US20170139314A1
公开(公告)日：2017-05-18
申请号：US15251042
申请日：2016-08-30
Applicant: National Applied Research Laboratories
Inventor： Jiun-Woei Huang , Shih-Feng Tseng , Wei-Cheng Lin , Lu-Hua Chen
CPC classification number: G03B21/28 , G02B13/22 , G02B17/08 , G02B17/0896 , G02B27/0025 , G02B27/0172 , G03B21/147
Abstract: A projector having a first end and a second end opposite to the first end includes an image source, a mirror and a first lens set. The image source is disposed at the first end, and projects lights of an image along a first direction. The mirror is disposed at the second end along the first direction. The first lens set is disposed between the image source and the mirror, and forms for the lights a common aperture located between the first lens set and the mirror.
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