公开(公告)号：US20030080302A1

公开(公告)日：2003-05-01

申请号：US10279854

申请日：2002-10-25

Applicant: National Inst. of Advanced Ind. Science and Tech.

Inventor： Hidehiko Yashiro

IPC: H05B035/00

CPC classification number: H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

Abstract: A method for the elimination of high-energy ion in an EUV light-radiating device includes irradiating a first target with a first exciting laser to produce a laser-produced plasma EUV light source and causing a high-energy ion generated simultaneously with EUV light to collide against plasma produced by irradiating a second target with a second laser to separate the high-energy ion from the orbit of the EUV light. An apparatus for the elimination of a high-energy ion in an EUV light-radiating device includes a device for irradiating a first target with a first exciting laser to produce a plasma EUV light source and induce emission of EUV light, a device for irradiating a second target with a second laser to produce plasma, and a device for causing a high-energy ion generated simultaneously with the EUV light to be delayed by difference between an ion flight time and plasma expansion time for ion elimination and collide against the plasma to separate the high-energy ion from the orbit of the EUV light.

Abstract translation: 一种在EUV光辐射装置中消除高能离子的方法包括用第一激光激光器照射第一靶，以产生激光产生的等离子体EUV光源，并使与EUV光同时产生的高能离子 与通过用第二激光器照射第二靶标而产生的等离子体相撞，以将高能离子与EUV光的轨道分离。 用于消除EUV光辐射装置中的高能离子的装置包括用于用第一激光激光器照射第一靶的装置，以产生等离子体EUV光源并诱发EUV光的发射，用于照射 用第二激光器产生等离子体的第二靶，以及用于使与EUV光同时产生的高能离子的装置由离子飞行时间和离子消除的等离子体膨胀时间之间的差异延迟，并与等离子体碰撞以分离 来自EUV光源轨道的高能离子。