公开(公告)号：US20030067598A1

公开(公告)日：2003-04-10

申请号：US10263699

申请日：2002-10-04

Applicant: National Inst. of Advanced Ind. Science and Tech.

Inventor： Toshihisa Tomie

IPC: G01N021/88

CPC classification number: G03F1/84 ,  G01N21/33 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/95676 ,  G03F1/24

Abstract: A method for inspecting multilayer masks to detect any defects includes illuminating a pixel region on a mask to be inspected, using illuminating light having a peak wavelength that is close to that of light reflected by the mask. The illuminating light specularly reflected by the mask is blocked Scattered reflected illuminating light is collected and used to form an enlarged image. An image detector having a large plurality of pixels is used to observe the enlarged image to detect whether there are defects on the mask. The method is implemented using an mask inspection apparatus including a plasma light source for generating radiant rays, an illuminating light collecting optical system that collects radiated light from the light source for enlarged image formation illumination of a subject inspection region, a Schwarzschild optical system including convex and concave mirrors for collecting scattered light from the subject inspection region and forming an enlarged image of the inspection region, an image detector having a large plurality of pixels for recording the enlarged image that is obtained, and an analyzer that analyzes the images obtained to determine whether there is a defect.

Abstract translation: 用于检查多层掩模以检测任何缺陷的方法包括使用具有接近由掩模反射的光的峰值波长的照明光照射待检查的掩模上的像素区域。 由掩模镜面反射的照明光被遮蔽散射的反射照明光被收集并用于形成放大的图像。 使用具有大量多个像素的图像检测器来观察放大图像以检测掩模上是否存在缺陷。 该方法使用包括用于产生辐射线的等离子体光源的掩模检查装置来实现，收集来自光源的辐射光以用于对象检查区域的放大图像形成照明的照明聚光光学系统，包括凸起的施瓦茨光学系统 以及用于收集来自被检查区域的散射光并形成检查区域的放大图像的凹面镜，具有用于记录所获得的放大图像的大量多个像素的图像检测器，以及分析器，其分析所获得的图像以确定 是否存在缺陷。