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公开(公告)号：US10562223B2
公开(公告)日：2020-02-18
申请号：US15769494
申请日：2016-10-17
Inventor： Kenta Suzuki , SungWon Youn , Hiroshi Hiroshima
Abstract: An imprint device according to the present invention is provided with a supply device that supplies a plurality of condensable gases, which have different saturated vapor pressures, at a fixed ratio by a first condensable gas tank (6) and a control valve (6a) and a second condensable gas tank (6) and a control valve (7a) when a concave portion formed in a mold is transferred in an atmosphere of a condensable gas, which condenses at a temperature and a pressure in the concave portion, the concave portion being sealed by a resist layer that enters into the concave portion formed in the mold (3). The imprint device makes it possible to prevent resist filling failure caused by capillary condensation and to adjust pattern line width and shape by using the same mold.
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公开(公告)号：US10189203B2
公开(公告)日：2019-01-29
申请号：US15029481
申请日：2014-08-29
Inventor： Sung Won Youn , Sang Cheon Park , Hiroshi Hiroshima , Hideki Takagi , Kenta Suzuki
Abstract: Provided is a method for forming a pattern of polyimide that is simpler and is more excellent in the pattern shape and in the dimensional accuracy in comparison with the conventional techniques of patterning polyimide, such as photolithography and laser processing. In a method for forming a micropattern of polyimide, which includes using as polyimide a solvent-soluble polyimide resin composition that is photosensitive and is moldable at a temperature of less than or equal to a glass-transition temperature; patterning the composition using thermal imprinting; and thermally curing the composition, ultraviolet irradiation is performed after the composition is released from a mold after a molding step.
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