公开(公告)号：US09513567B2

公开(公告)日：2016-12-06

申请号：US14363489

申请日：2012-12-04

Applicant: National Institute of Advanced Industrial Science and Technology

Inventor： Shiro Hara ,  Sommawan Khumpuang ,  Yoshiki Inuzuka ,  Yasuaki Yokoyama

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/677

CPC classification number: G03F7/70716 ,  G03F7/2051 ,  G03F7/70733 ,  H01L21/677 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67796

Abstract: To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask aligner 1 that exposes a wafer W in a predetermined size through a mask M, and has a configuration that includes: a conveying device 5 for conveying the wafer W and the mask M; an exposure stage 3f on which the wafer W conveyed by the conveying device 5 is installed; a mask holder 3b that is mounted to face the exposure stage 3f and on which the mask M conveyed by the conveying device 5 is installed; and an LED light source 8c mounted to face the exposure stage 3f via the mask holder 3b.

Abstract translation: 提供可以适当地管理非常小批量的生产和多产品生产的掩模对准器。 本发明是一种掩模对准器1，其通过掩模M使预定尺寸的晶片W曝光，并具有包括：用于输送晶片W和掩模M的输送装置5; 曝光台3f，其上安装由输送装置5输送的晶片W; 安装在面对曝光台3f并且由传送装置5输送的面罩M安装在其上的面罩座3b; 以及经由掩模保持器3b安装成面向曝光台3f的LED光源8c。

公开(公告)号：US20140320840A1

公开(公告)日：2014-10-30

申请号：US14363489

申请日：2012-12-04

Applicant: National Institute of Advanced Industrial Science and Technology

Inventor： Shiro Hara ,  Sommawan Khumpuang ,  Yoshiki Inuzuka ,  Yasuaki Yokoyama

IPC: G03F7/20 ,  H01L21/677

CPC classification number: G03F7/70716 ,  G03F7/2051 ,  G03F7/70733 ,  H01L21/677 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67796

Abstract: To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask aligner 1 that exposes a wafer W in a predetermined size through a mask M, and has a configuration that includes: a conveying device 5 for conveying the wafer W and the mask M; an exposure stage 3f on which the wafer W conveyed by the conveying device 5 is installed; a mask holder 3b that is mounted to face the exposure stage 3f and on which the mask M conveyed by the conveying device 5 is installed; and an LED light source 8c mounted to face the exposure stage 3f via the mask holder 3b.

Abstract translation: 提供可以适当地管理非常小批量的生产和多产品生产的掩模对准器。 本发明是一种掩模对准器1，其通过掩模M使预定尺寸的晶片W曝光，并具有包括：用于输送晶片W和掩模M的输送装置5; 曝光台3f，其上安装由输送装置5输送的晶片W; 安装在面对曝光台3f并且由传送装置5输送的面罩M安装在其上的面罩座3b; 以及经由掩模保持器3b安装成面向曝光台3f的LED光源8c。