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公开(公告)号:US10211105B2
公开(公告)日:2019-02-19
申请号:US15816247
申请日:2017-11-17
发明人: Bing-Joe Hwang , Wei-Nien Su , Jeng-Ywan Jeng , Yuan-Han Chu , Tse-Ming Chiu , Hsin-Fu Teng
IPC分类号: H01L21/306 , H01L21/78 , B28D5/04 , H01L21/3063
摘要: An apparatus for cutting a substrate is disclosed. The apparatus includes a main body containing a reactive solution and the substrate; and a catalytic cutting element disposed inside the main body and contacting one of at least two adjacent cutting peripheries of the substrate to conduct a chemical reaction to cut the substrate.
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公开(公告)号:US09852948B2
公开(公告)日:2017-12-26
申请号:US15015061
申请日:2016-02-03
发明人: Bing-Joe Hwang , Wei-Nien Su , Jeng-Ywan Jeng , Yuan-Han Chu , Tse-Ming Chiu , Hsin-Fu Teng
IPC分类号: H01L21/306 , H01L21/78 , B28D5/04 , H01L21/3063
CPC分类号: H01L21/78 , B28D5/04 , H01L21/30604 , H01L21/3063
摘要: A method of processing a substrate is disclosed. The method includes the following steps: providing a substrate body having a surface; placing a die on the surface, wherein the die acts as a catalyst; immersing the substrate body and the die in a reaction solution; and processing the substrate body via a chemical reaction occurring on the surface through the reaction solution and the catalyst.
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公开(公告)号:US20180076089A1
公开(公告)日:2018-03-15
申请号:US15816247
申请日:2017-11-17
发明人: Bing-Joe Hwang , Wei-Nien Su , Jeng-Ywan Jeng , Yuan-Han Chu , Tse-Ming Chiu , Hsin-Fu Teng
IPC分类号: H01L21/78 , B28D5/04 , H01L21/306 , H01L21/3063
CPC分类号: H01L21/78 , B28D5/04 , H01L21/306 , H01L21/30604 , H01L21/3063
摘要: An apparatus for cutting a substrate is disclosed. The apparatus includes a main body containing a reactive solution and the substrate; and a catalytic cutting element disposed inside the main body and contacting one of at least two adjacent cutting peripheries of the substrate to conduct a chemical reaction to cut the substrate.
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公开(公告)号:US20160233129A1
公开(公告)日:2016-08-11
申请号:US15015061
申请日:2016-02-03
发明人: Bing-Joe Hwang , Wei-Nien Su , Jeng-Ywan Jeng , Yuan-Han Chu , Tse-Ming Chiu , Hsin-Fu Teng
IPC分类号: H01L21/78 , H01L21/306 , H01L21/3063
CPC分类号: H01L21/78 , B28D5/04 , H01L21/30604 , H01L21/3063
摘要: A method of processing a substrate is disclosed. The method includes the following steps: providing a substrate body having a surface; placing a die on the surface, wherein the die acts as a catalyst; immersing the substrate body and the die in a reaction solution; and processing the substrate body via a chemical reaction occurring on the surface through the reaction solution and the catalyst.
摘要翻译: 公开了一种处理衬底的方法。 该方法包括以下步骤:提供具有表面的基底主体; 将模具放置在表面上,其中模具用作催化剂; 将基体和模头浸入反应溶液中; 以及通过反应溶液和催化剂在表面上发生的化学反应来处理衬底体。
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